Jun Zhu
at Shanghai Hua Hong NEC Electronics Co Ltd
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 27 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Logic, Scanning probe lithography, Photoresist materials, Photomasks, Optical proximity correction, Critical dimension metrology, Line edge roughness, Neodymium, Photoresist processing, Binary data

Proceedings Article | 26 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Point spread functions, Electronics, Lithium, Diffusion, Photoresist materials, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Testing and analysis

Proceedings Article | 26 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Point spread functions, Lithium, Optical lithography, Silicon, Diffusion, Electroluminescence, Photoresist materials, Photomasks, Optical proximity correction, Semiconducting wafers

Proceedings Article | 21 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Point spread functions, Electronics, Optical lithography, Scanners, Diffusion, Image resolution, Photomasks, Optical proximity correction, Photoresist processing, Semiconducting wafers

Proceedings Article | 20 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Deep ultraviolet, Scanners, Diffusion, Photomasks, Bismuth, Optical proximity correction, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Tolerancing

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