Jung Hoon Park
at Samsung Electronics Co Ltd
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Electron beams, Curium, Etching, Ions, Chromium, Photomasks, Plasma etching, Critical dimension metrology, Photoresist processing, Information operations

Proceedings Article | 15 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Electron beam lithography, Electron beams, Backscatter, Scattering, Laser scattering, Control systems, Monte Carlo methods, Photomasks, Optical proximity correction, Mask making

Proceedings Article | 24 June 2005
Proc. SPIE. 5960, Visual Communications and Image Processing 2005
KEYWORDS: Image compression, Color prediction, Image processing, Video, Chromium, Computer simulations, Video compression, Video processing, Video coding, Lead

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