Dr. Jung-Hoon Ser
Principal Engineer at ASML San Jose
SPIE Involvement:
Author
Area of Expertise:
Semiconductor Lithography , Computational Lithography
Publications (8)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Image processing, Photomasks, Machine learning, Source mask optimization, Computational lithography, Optical proximity correction, SRAF, Model-based design

PROCEEDINGS ARTICLE | April 5, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Reticles, Optical lithography, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Model-based design, 193nm lithography

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Cadmium, Data modeling, Error analysis, Photomasks, Artificial intelligence, Optical proximity correction, Neodymium, Semiconducting wafers, Statistical modeling, Performance modeling

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Metrology, Cadmium, Data modeling, Calibration, 3D modeling, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Laser metrology

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Photovoltaics, Data modeling, Calibration, Photomasks, Optical proximity correction, SRAF, Nanoimprint lithography, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | September 29, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Lithography, Calibration, Diffusion, Scanning electron microscopy, Photomasks, Cadmium sulfide, Optical proximity correction, SRAF, Critical dimension metrology, Performance modeling

Showing 5 of 8 publications
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