Dr. Jung-Hwan Hah Profile

Dr. Jung-Hwan Hah

Senior Engineer at SAMSUNG Electronics Co Ltd

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Author

Publications (5)

Proceedings Article | 29 March 2006 Paper

Top barrier coating materials for immersion lithography and beyond

Mitsuhiro Hata, Jin-Young Yoon, Jung-Hwan Hah, Man-Hyoung Ryoo, Sang-Jun Choi, Han-Ku Cho

Proceedings Volume 6153, 61531Y (2006) https://doi.org/10.1117/12.655955

KEYWORDS: Photoresist materials, Thin film coatings, Extreme ultraviolet lithography, Polymers, Coating, Photoresist developing, Semiconducting wafers, Extreme ultraviolet, Lithography, Scanning electron microscopy

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Proceedings Article | 29 March 2006 Paper

Spin-on hard mask with dual-BARC property for 50-nm devices

Jung Hwan Hah, Yun Sook Chae, Yun-Kyeong Jang, Manhyoung Ryoo, Sang-Jun Choi, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 6153, 61530L (2006) https://doi.org/10.1117/12.656075

KEYWORDS: Etching, Chemical vapor deposition, Photomasks, System on a chip, Lithography, Optical properties, Carbon, Silicon, Semiconductors, Immersion lithography

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Proceedings Article | 4 May 2005 Paper

Novel chemical shrinkage material for small contact hole and small space patterning

Mitsuhiro Hata, Jung-Hwan Hah, Hyun-Woo Kim, Man-Hyoung Ryoo, Sang-Gyun Woo, Han-Ku Cho

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599468

KEYWORDS: Polymers, Photoresist materials, Semiconducting wafers, Optical lithography, Chemical reactions, Magnesium, Critical dimension metrology, Resolution enhancement technologies, Industrial chemicals, Scanning electron microscopy

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Proceedings Article | 4 May 2005 Paper

In-line chemical shrink process for 70 nm contact hole patterns by the room-temperature electrostatic self-assembly

Jung Hwan Hah, Subramanya Mayya, Mitsuhiro Hata, Hyun-Woo Kim, Man-Hyoung Ryoo, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon, Byung-Il Ryu

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599450

KEYWORDS: Optical lithography, Lithography, Photoresist processing, Chemical reactions, Resolution enhancement technologies, Hydrogen, Scanning electron microscopy, Polymers, Interfaces, Semiconductor manufacturing

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Proceedings Article | 14 May 2004 Paper

Strategy for sub-80nm contact hole patterning considering device fabrication

Jin-Young Yoon, Mitsuhiro Hata, Jung-Hwan Hah, Hyun-Woo Kim, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534811

KEYWORDS: Critical dimension metrology, Photomasks, Photoresist materials, Lithography, Cadmium, Optical lithography, Image processing, Resolution enhancement technologies, Semiconducting wafers, Temperature metrology

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