Dr. Jung-Hwan Hah
Senior Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Polymers, Coating, Scanning electron microscopy, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Thin film coatings, Semiconducting wafers, Photoresist developing

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Semiconductors, Carbon, Lithography, Optical properties, Etching, Silicon, Chemical vapor deposition, Photomasks, Immersion lithography, System on a chip

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Optical lithography, Polymers, Interfaces, Hydrogen, Scanning electron microscopy, Semiconductor manufacturing, Chemical reactions, Photoresist processing, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Magnesium, Optical lithography, Polymers, Scanning electron microscopy, Photoresist materials, Chemical reactions, Critical dimension metrology, Semiconducting wafers, Industrial chemicals, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Optical lithography, Cadmium, Image processing, Photoresist materials, Photomasks, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies, Temperature metrology

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