Jung Woo Kim
at Dongjin Semichem Co Ltd
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 3 April 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Polymers, Polymerization, Line width roughness, Immersion lithography, Palladium, Line edge roughness, Photoresist processing, Promethium, Polymer thin films, Semiconducting wafers

Proceedings Article | 23 March 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Polymers, Semiconducting wafers, Fluorine, Immersion lithography, Semiconductors, Polymer thin films, Photoresist materials, Lithography, Manufacturing, Silicon

Proceedings Article | 11 April 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Polymers, Molecules, Digital watermarking, Photoresist processing, Liquids, Polymer thin films, Water, Optical lithography, Molecular interactions, Glasses

Proceedings Article | 4 May 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Diffusion, Polymers, Photoresist materials, Optical lithography, Electrodes, Lithography, Semiconducting wafers, Resistance, Optical proximity correction, Quenching (fluorescence)

Proceedings Article | 14 May 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Polymers, Photoresist processing, Lithography, Photoresist materials, Diffusion, Semiconducting wafers, Silicon, Photorefractive polymers, Scanning electron microscopy, Electronic components

Showing 5 of 7 publications
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