Jung Youl Lee
at Dongjin Semichem Co Ltd
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Carbon, Lithography, Refractive index, Ultraviolet radiation, Silicon, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Molybdenum, Ruthenium

Proceedings Article | 3 April 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Polymers, Polymerization, Line width roughness, Palladium, Promethium, Immersion lithography, Line edge roughness, Photoresist processing, Semiconducting wafers, Polymer thin films

Proceedings Article | 23 March 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Polymers, Image processing, Molecules, Diffusion, Reflectivity, Image resolution, Extreme ultraviolet lithography, Line edge roughness, Photoresist processing

Proceedings Article | 23 March 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Semiconductors, Lithography, Polymers, Silicon, Manufacturing, Photoresist materials, Immersion lithography, Fluorine, Semiconducting wafers, Polymer thin films

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Semiconductors, Lithography, Monochromatic aberrations, Polymers, Molecules, Diffusion, Photoresist materials, Critical dimension metrology, Photoresist processing, Semiconducting wafers

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