JungTae Lee
Application Eng - Kla-tencor Korea at
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | April 27, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Apodization, Metrology, Polarization, Laser scattering, Quality measurement, Scatterometry, Image quality, Laser metrology, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Statistical analysis, Image segmentation, Manufacturing, Scanning electron microscopy, Process control, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers, Stochastic processes, Overlay metrology

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