Dr. Junghyung Lee
Senior Engineer at SK Hynix Inc
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Optical lithography, Etching, Image processing, Image analysis, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Failure analysis

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Optical lithography, Ultraviolet radiation, Ions, Manufacturing, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Nanoimprint lithography, Line edge roughness, Neodymium

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Scanners, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Source mask optimization, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers, Stochastic processes, Resolution enhancement technologies

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Optical lithography, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Double patterning technology, Nanoimprint lithography, Photoresist processing, Semiconducting wafers, Absorption

Proceedings Article | 16 April 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Optical lithography, Etching, Image processing, Resistance, Electroluminescence, Photomasks, Image enhancement, Photoresist processing, Semiconducting wafers

Showing 5 of 8 publications
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