Dr. Junichi Onodera
General Manager at Tokyo Ohka Kogyo Co Ltd
SPIE Involvement:
Conference Program Committee | Author
Publications (9)

Proceedings Article | 30 March 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Fullerenes, Etching, Nanolithography, Electron beams, Lithography, Polymers, Reactive ion etching, Ultraviolet radiation, Line edge roughness, Silicon

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Surface roughness, Line edge roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Coating, Molecules, Chemical analysis, Atomic force microscopy, Light sources, Spectroscopy

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Polymers, Extreme ultraviolet lithography, Extreme ultraviolet, Absorption, Chemically amplified resists, Absorbance, Image processing, Silicon, Ultraviolet radiation, Line width roughness

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Diffusion, Lithography, Polymers, Semiconducting wafers, Molecular interactions, Photoresist materials, Sensors, Hydrogen, Silicon, Chemically amplified resists

Proceedings Article | 26 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Fullerenes, Etching, Electron beams, Silicon, Nanolithography, Ultraviolet radiation, Photoresist processing, Line edge roughness, Polymers, Scanning electron microscopy

Showing 5 of 9 publications
Conference Committee Involvement (3)
SPIE Lithography Asia - Korea
13 October 2010 | n/a, Republic of Korea
SPIE Lithography Asia - Taiwan
18 November 2009 | Taipei, Taiwan
SPIE Lithography Asia - Taiwan
4 November 2008 | Taipei, Taiwan
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