Junji Hirumi
at SELETE
SPIE Involvement:
Conference Program Committee | Author
Publications (11)

Proceedings Article | 9 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Manufacturing, Inspection, Printing, Photomasks, Optical proximity correction, Data conversion, Electronic design automation, Standards development, Vestigial sideband modulation, Resolution enhancement technologies

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Semiconductors, Inspection, Printing, Photomasks, Optical proximity correction, Data conversion, Electronic design automation, Standards development, Vestigial sideband modulation, Resolution enhancement technologies

Proceedings Article | 16 June 2005
Proc. SPIE. 5835, 21st European Mask and Lithography Conference
KEYWORDS: Manufacturing, Inspection, Inspection equipment, Photomasks, Integrated circuits, Mask making, Data conversion, Standards development, Vestigial sideband modulation, Resolution enhancement technologies

Proceedings Article | 6 December 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Semiconductors, Data compression, Manufacturing, Cobalt, Printing, Photomasks, Data conversion, Photomask technology, Standards development, Vestigial sideband modulation

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Semiconductors, Nanotechnology, Data compression, Manufacturing, Printing, Photomasks, Data conversion, Prototyping, Vestigial sideband modulation, Resolution enhancement technologies

Showing 5 of 11 publications
Conference Committee Involvement (1)
Photomask and Next-Generation Lithography Mask Technology XII
13 April 2005 | Yokohama, Japan
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