Dr. Junji Miyazaki
Director, Technology Development Ctr. at ASML Japan Co Ltd
SPIE Involvement:
Author
Publications (25)

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Metrology, Metals, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, SRAF

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Lithography, Scanners, Inspection, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Double patterning technology, Source mask optimization, Neodymium

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Diffraction, Mirrors, Inspection, Printing, Photomasks, Extreme ultraviolet, Nanoimprint lithography, Semiconducting wafers, Prototyping, 3D image processing

PROCEEDINGS ARTICLE | September 4, 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Diffraction, Mirrors, Inspection, Printing, Photomasks, Extreme ultraviolet, Nanoimprint lithography, Semiconducting wafers, Prototyping, 3D image processing

PROCEEDINGS ARTICLE | July 9, 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Diffraction, Mirrors, Reflectivity, Printing, Photomasks, Extreme ultraviolet, Nanoimprint lithography, Semiconducting wafers, Prototyping, 3D image processing

PROCEEDINGS ARTICLE | October 17, 2014
Proc. SPIE. 9231, 30th European Mask and Lithography Conference
KEYWORDS: Refractive index, Reticles, Atrial fibrillation, Etching, Quartz, Photomasks, Cadmium sulfide, Immersion lithography, Semiconducting wafers, Phase shifts

Showing 5 of 25 publications
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