Junjiang Lei
at TSMC North America
SPIE Involvement:
Publications (14)

Proceedings Article | 28 March 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Lithography, Photovoltaics, Optical lithography, Metals, Image processing, Solar cells, Electroluminescence, Photomasks, Source mask optimization, Molybdenum, Optimization (mathematics), Process modeling, Resolution enhancement technologies, Lead

SPIE Journal Paper | 29 September 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Directed self assembly, Lens design, Optical lithography, Immersion lithography, Photomasks, Neck, Lithography, Critical dimension metrology, Visualization, Optical proximity correction

Proceedings Article | 22 March 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Code division multiplexing, Neck, Lithography, Optical lithography, Modulation, Visualization, Ions, Lens design, Optical resolution, Photomasks, Extreme ultraviolet, Directed self assembly, Immersion lithography, Neodymium, Semiconducting wafers

Proceedings Article | 16 March 2016
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Lithography, Optical lithography, Metals, Manufacturing, Design for manufacturing, Photomasks, Double patterning technology, Immersion lithography, Source mask optimization, Optical proximity correction, Analytical research, Algorithm development, Optimization (mathematics), New and emerging technologies

SPIE Journal Paper | 11 September 2015
JM3 Vol. 14 Issue 03
KEYWORDS: Dysprosium, Photomasks, Immersion lithography, Source mask optimization, Optical proximity correction, Printing, Optical lithography, Visualization, Lens design, Directed self assembly

Showing 5 of 14 publications
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