Mr. Junjiro Sakai Profile

Junjiro Sakai

Senior Principal Engineer at Renesas Electronics Corp

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Author

Publications (7)

Proceedings Article | 16 March 2009 Paper

A proposed image intensity expressing local irradiance

Shuji Nakao, Itaru Kanai, Shinroku Maejima, Mitsuru Okuno, Naohisa Tamada, Junjiro Sakai, Akira Imai, Tetsuro Hanawa, Kazuyuki Suko

Proceedings Volume 7274, 72742Z (2009) https://doi.org/10.1117/12.812203

KEYWORDS: Polarization, Photomasks, Electromagnetism, Image filtering, Diffraction, Optical lithography, Magnetism, Lithography, Apodization, Radiometric corrections

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Proceedings Article | 26 March 2007 Paper

OPC-free on-grid fine random hole pattern formation utilizing double resist patterning with double RETs

Shuji Nakao, Shinroku Maejima, Takeshi Yamamoto, Yoshiharu Ono, Junjiro Sakai, Atsumi Yamaguchi, Akira Imai, Tetsuro Hanawa, Kazuyuki Sukoh

Proceedings Volume 6520, 65203W (2007) https://doi.org/10.1117/12.711055

KEYWORDS: Optical lithography, Scanning electron microscopy, Photography, Double patterning technology, Photomasks, Photoresist processing, Resolution enhancement technologies, Argon, Ion implantation, Current controlled current source

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Proceedings Article | 15 March 2006 Paper

Application of super-diffraction lithography (SDL) for an actual device fabrication

Shuji Nakao, Shinroku Maejima, Itaru Kanai, Akihiro Nakae, Junjiro Sakai, Koichiro Narimatsu, Kazuyuki Suko

Proceedings Volume 6154, 61542A (2006) https://doi.org/10.1117/12.656043

KEYWORDS: Photomasks, Critical dimension metrology, Printing, Photography, Lithography, Scanning electron microscopy, Optical proximity correction, Logic devices, Resolution enhancement technologies, Binary data

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Proceedings Article | 26 June 2003 Paper

Simple and highly sensitive focus monitoring utilizing an aperture on backside of photomask

Shuji Nakao, Junjirou Sakai, Shinroku Maejima, Atsushi Ueno, Akihiro Nakae, Shigenori Yamashita, Ken-ichi Itano, Hidehiko Kozawa, Akira Tokui, Kouichirou Tsujita

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485324

KEYWORDS: Photomasks, Semiconducting wafers, Chromium, Modulation, Overlay metrology, Monochromatic aberrations, Geometrical optics, Double patterning technology, Quartz, Wafer-level optics

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Proceedings Article | 12 June 2003 Paper

Relationship between optical property of pattern image and adhesion of resist pattern

Junjiro Sakai, Akihiro Nakae, Atsumi Yamaguchi, Kouichirou Tsujita

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.483760

KEYWORDS: Reflectivity, Photoresist materials, Oxides, Photomasks, Phase shifts, Optical properties, Interfaces, Lithography, Neodymium, Refractive index

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Proceedings Article | 29 June 1998 Paper

Influence of aberration on performance during use of resolution enhancement technology

Kouichirou Tsujita, Junjiro Sakai, Akihiro Nakae, Shuji Nakao, Wataru Wakamiya

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310820

KEYWORDS: Monochromatic aberrations, Printing, Optical proximity correction, Resolution enhancement technologies, Phase shifts, Imaging systems, Photomasks, Projection systems, Lithographic illumination, Lithography

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Proceedings Article | 7 July 1997 Paper

Dry etching resistance of resist base polymer and its improvement

Shinji Kishimura, Yoshika Kimura, Junjiro Sakai, Kouichirou Tsujita, Yasuji Matsui

Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275894

KEYWORDS: Polymers, Resistance, Etching, Dry etching, Deep ultraviolet, Chlorine, Plasma, Temperature metrology, Molecules, Absorbance

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Showing 5 of 7 publications

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