Jun Sung Chun
at
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Publications (19)

PROCEEDINGS ARTICLE | April 11, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Lithography, Scattering, Etching, Annealing, X-rays, Silicon, Transmission electron microscopy, Directed self assembly, Picosecond phenomena, Reactive ion etching

PROCEEDINGS ARTICLE | April 4, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Lithography, Optical lithography, Etching, Scanners, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Neodymium, Semiconducting wafers, Photoresist developing

SPIE Journal Paper | March 14, 2016
JM3 Vol. 15 Issue 01
KEYWORDS: Directed self assembly, Critical dimension metrology, Scatterometry, Polymethylmethacrylate, Optical components, Picosecond phenomena, Optical simulations, Chemical elements, Optical lithography, Ellipsometry

PROCEEDINGS ARTICLE | May 27, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Oxides, Optical lithography, Nanoparticles, Metals, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Zirconium dioxide, Photoresist developing

PROCEEDINGS ARTICLE | May 27, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Oxides, Optical lithography, Deep ultraviolet, Nanoparticles, Metals, Particles, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Zirconium dioxide

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Oxides, Electron beam lithography, Magnesium, Nanoparticles, Particles, Photoresist materials, Extreme ultraviolet lithography, Sodium, Hafnium, Absorption

Showing 5 of 19 publications
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