Jun-Wei Lu
at ASML Intl Trading Co Ltd
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 18 March 2019
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Light sources, Deep ultraviolet, Scanners, Control systems, Source mask optimization, Critical dimension metrology, Semiconducting wafers, Yield improvement

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Pattern recognition, Electroluminescence, Scanning electron microscopy, Printing, Photomasks, Source mask optimization, Optical proximity correction, SRAF, Semiconducting wafers

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