Jun-Wei Lu
at ASML Intl Trading Co Ltd
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 18 March 2019 Presentation
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Critical dimension metrology, Light sources, Semiconducting wafers, Yield improvement, Deep ultraviolet, Scanners, Control systems, Source mask optimization

Proceedings Article | 20 March 2018 Presentation + Paper
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Photomasks, Source mask optimization, Optical proximity correction, Lithography, SRAF, Semiconducting wafers, Printing, Electroluminescence, Scanning electron microscopy, Pattern recognition

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top