Dr. Junwei Wei
Research Scientist at KLA-Tencor Corp
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Electron beam lithography, Metrology, Deep ultraviolet, Inspection, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Stochastic processes

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Lithography, Defect detection, Etching, Manufacturing, Inspection, Scanning electron microscopy, Optical inspection, Thin film coatings, Semiconducting wafers, Signal detection

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