Dr. Junyan Dai
at Applied Materials Inc
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 11 December 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Optical lithography, Optical properties, Ultraviolet radiation, Silicon, Chemistry, Photoresist materials, Double patterning technology, Semiconducting wafers, Photoresist developing

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, FT-IR spectroscopy, Optical lithography, Optical properties, Ultraviolet radiation, Silicon, Photoresist materials, Double patterning technology, Time division multiplexing, Semiconducting wafers

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Antireflective coatings, Optical lithography, Image processing, Ultraviolet radiation, Fourier transforms, Photoresist materials, Double patterning technology, Photoresist processing, Semiconducting wafers

Proceedings Article | 15 April 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Metrology, Scanners, Particles, Scanning electron microscopy, Silicon films, Lutetium, Critical dimension metrology, Semiconducting wafers, Wafer testing

Proceedings Article | 15 April 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Optical lithography, Ultraviolet radiation, Coating, Printing, Photoresist materials, Double patterning technology, Photoresist processing, Semiconducting wafers, Floods

Showing 5 of 11 publications
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