Jürgen Gramss
at Vistec Electron Beam Lithography Group
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 2 April 2011 Paper
Proc. SPIE. 7985, 27th European Mask and Lithography Conference
KEYWORDS: Lithography, Statistical analysis, Scanning electron microscopy, Photomasks, Optical simulations, Beam shaping, Logic devices, Optical proximity correction, Standards development, Vestigial sideband modulation

Proceedings Article | 25 September 2010 Paper
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Lithography, Electron beam lithography, Metals, Photomasks, Integrated optics, Beam shaping, Source mask optimization, Computational lithography, Optical proximity correction, Vestigial sideband modulation

Proceedings Article | 23 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Lithography, Electron beam lithography, Magnesium, Visualization, Data processing, Photomasks, Beam shaping, Data conversion, Computer architecture, Standards development

Proceedings Article | 27 May 2009 Paper
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Magnesium, Visualization, Computer simulations, Data processing, Photomasks, Algorithm development, Electron beam direct write lithography

Proceedings Article | 3 May 2007 Paper
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Semiconductors, Lithography, Electron beam lithography, Electron beams, Manufacturing, Photomasks, Beam shaping, Electron beam direct write lithography, Prototyping, Vestigial sideband modulation

Showing 5 of 14 publications
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