Jürgen Gramss
at Vistec Electron Beam Lithography Group
SPIE Involvement:
Author
Publications (14)

PROCEEDINGS ARTICLE | April 2, 2011
Proc. SPIE. 7985, 27th European Mask and Lithography Conference
KEYWORDS: Photomasks, Vestigial sideband modulation, Beam shaping, Lithography, Optical simulations, Logic devices, Optical proximity correction, Standards development, Statistical analysis, Scanning electron microscopy

PROCEEDINGS ARTICLE | September 25, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Photomasks, Vestigial sideband modulation, Beam shaping, Metals, Lithography, Electron beam lithography, Optical proximity correction, Source mask optimization, Computational lithography, Integrated optics

PROCEEDINGS ARTICLE | September 23, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Photomasks, Beam shaping, Data conversion, Magnesium, Electron beam lithography, Data processing, Visualization, Standards development, Lithography, Computer architecture

PROCEEDINGS ARTICLE | May 27, 2009
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Data processing, Computer simulations, Photomasks, Visualization, Electron beam direct write lithography, Lithography, Magnesium, Electron beams, Electron beam lithography, Algorithm development

PROCEEDINGS ARTICLE | May 3, 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Electron beam direct write lithography, Electron beams, Vestigial sideband modulation, Semiconductors, Prototyping, Manufacturing, Photomasks, Beam shaping, Electron beam lithography, Lithography

PROCEEDINGS ARTICLE | May 3, 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Electron beam direct write lithography, Semiconducting wafers, Magnesium, Photomasks, Beam shaping, Electron beams, Optical lithography, Mask making, Vestigial sideband modulation, Lithography

Showing 5 of 14 publications
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