Dr. Justin Hwu
Sr. Application Engineer at Hitachi High Technologies America
SPIE Involvement:
Author
Publications (15)

SPIE Journal Paper | 12 August 2014
JM3 Vol. 13 Issue 03
KEYWORDS: Servomechanisms, Beam propagation method, Scanning electron microscopy, Quartz, Magnetism, Nanoimprint lithography, Etching, Optical lithography, Lithography, Directed self assembly

SPIE Journal Paper | 2 August 2013
JM3 Vol. 12 Issue 03
KEYWORDS: Spherical lenses, Magnetism, Picosecond phenomena, Servomechanisms, Quartz, Beam propagation method, Lithography, Nanoimprint lithography, Reactive ion etching, Directed self assembly

Proceedings Article | 3 April 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Metrology, Statistical analysis, Image processing, Image analysis, Scanning electron microscopy, Transmission electron microscopy, Signal processing, Nanoimprint lithography, Beam propagation method, Process modeling

SPIE Journal Paper | 1 October 2010
JM3 Vol. 9 Issue 04
KEYWORDS: Picosecond phenomena, Scatterometry, Atomic force microscopy, Nanoimprint lithography, Calibration, Spectroscopic ellipsometry, Scanning electron microscopy, Photoresist processing, Metrology, Polarization

Proceedings Article | 2 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Metrology, Quartz, Image processing, Image analysis, Scanning electron microscopy, Transmission electron microscopy, Monte Carlo methods, Line width roughness, Critical dimension metrology, Process modeling

Proceedings Article | 11 December 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Metrology, Quartz, Ultraviolet radiation, Atomic force microscopy, Optical testing, Scanning electron microscopy, Nanoimprint lithography, Critical dimension metrology, Scanning transmission electron microscopy

Showing 5 of 15 publications
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