Dr. Jyhwei Hsu
Process Development Scientist, R&D at SUSS MicroTec (Taiwan) Co Ltd
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | October 5, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Electronics, Sensors, Quartz, Particles, Wave propagation, Transducers, Photomasks, Cavitation, Acoustics, Mask cleaning

PROCEEDINGS ARTICLE | October 4, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Glasses, Particles, Inspection, Oxygen, Photomasks, SRAF, Cavitation, Acoustics, Mask cleaning, Plasma

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Metals, Ions, Silicon, Oxygen, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Ozone, Ruthenium, Oxidation

PROCEEDINGS ARTICLE | October 30, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Metrology, Deep ultraviolet, Etching, Dry etching, Diffusion, Chromium, Printing, Photomasks, Critical dimension metrology, Photoresist processing

PROCEEDINGS ARTICLE | May 3, 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Data modeling, Deep ultraviolet, Manufacturing, Scanning electron microscopy, Photomasks, Optical proximity correction, Electron beam melting, Critical dimension metrology, Semiconducting wafers, Airborne remote sensing

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top