Dr. Jyhwei Hsu
Process Development Scientist, R&D at SUSS Microtec
SPIE Involvement:
Publications (5)

Proceedings Article | 5 October 2016 Paper
Claudio Zanelli, Dushyanth Giridhar, Manish Keswani, Nagaya Okada, Jyhwei Hsu, Petrie Yam
Proceedings Volume 9985, 998524 (2016) https://doi.org/10.1117/12.2243124
KEYWORDS: Acoustics, Cavitation, Transducers, Mask cleaning, Photomasks, Particles, Quartz, Sensors, Wave propagation, Electronics

Proceedings Article | 4 October 2016 Paper
Jyh-Wei Hsu, Martin Samayoa, Peter Dress, Uwe Dietze, Ai-Jay Ma, Chia-Shih Lin, Rick Lai, Peter Chang, Laurent Tuo
Proceedings Volume 9985, 998515 (2016) https://doi.org/10.1117/12.2241143
KEYWORDS: SRAF, Photomasks, Cavitation, Particles, Inspection, Glasses, Plasma, Mask cleaning, Acoustics, Oxygen

Proceedings Article | 23 October 2015 Paper
Proceedings Volume 9635, 96351B (2015) https://doi.org/10.1117/12.2202188
KEYWORDS: Oxidation, Ruthenium, Metals, Extreme ultraviolet, Silicon, Ions, Scanning electron microscopy, Photomasks, Oxygen, Ozone

Proceedings Article | 30 October 2007 Paper
Jyh Wei Hsu, David Lee, Chen Rui Tseng, Eric Hong, Chun Hung Wu
Proceedings Volume 6730, 67300I (2007) https://doi.org/10.1117/12.746654
KEYWORDS: Critical dimension metrology, Photomasks, Chromium, Dry etching, Etching, Printing, Photoresist processing, Diffusion, Deep ultraviolet, Metrology

Proceedings Article | 3 May 2007 Paper
Jyh Wei Hsu, Chun Hung Wu, Kevin Cheng
Proceedings Volume 6533, 65331A (2007) https://doi.org/10.1117/12.736524
KEYWORDS: Photomasks, Electron beam melting, Semiconducting wafers, Scanning electron microscopy, Deep ultraviolet, Optical proximity correction, Critical dimension metrology, Airborne remote sensing, Manufacturing, Data modeling

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