Dr. Jyhwei Hsu
Process Development Scientist, R&D at SUSS MicroTec (Taiwan) Co Ltd
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | October 5, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Acoustics, Cavitation, Transducers, Mask cleaning, Photomasks, Particles, Quartz, Sensors, Wave propagation, Electronics

PROCEEDINGS ARTICLE | October 4, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: SRAF, Photomasks, Cavitation, Particles, Inspection, Glasses, Plasma, Mask cleaning, Acoustics, Oxygen

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Oxidation, Ruthenium, Metals, Extreme ultraviolet, Silicon, Ions, Scanning electron microscopy, Photomasks, Oxygen, Ozone

PROCEEDINGS ARTICLE | October 30, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Critical dimension metrology, Photomasks, Chromium, Dry etching, Etching, Printing, Photoresist processing, Diffusion, Deep ultraviolet, Metrology

PROCEEDINGS ARTICLE | May 3, 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Photomasks, Electron beam melting, Semiconducting wafers, Scanning electron microscopy, Deep ultraviolet, Optical proximity correction, Critical dimension metrology, Airborne remote sensing, Manufacturing, Data modeling

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