Dr. K. Subramanya Mayya
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 20 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Lithography, Deep ultraviolet, Opacity, Polymers, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Double patterning technology, Chemical reactions

Proceedings Article | 11 December 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Optical transfer functions, Switches, Optical lithography, Polymers, Electrons, Scanning electron microscopy, Chromophores, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 4 May 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Optical lithography, Polymers, Interfaces, Hydrogen, Scanning electron microscopy, Semiconductor manufacturing, Chemical reactions, Photoresist processing, Resolution enhancement technologies

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