Mr. K. C. Chen
at Macronix International Co Ltd
SPIE Involvement:
Author
Publications (30)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Data modeling, Calibration, Image segmentation, 3D modeling, Feature extraction, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Lithography, Metrology, Image processing, Image acquisition, Feature extraction, Scanning electron microscopy, Finite element methods, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Semiconductors, Oxides, Lithography, Optical lithography, Etching, Scanners, Chemical vapor deposition, Plasma enhanced chemical vapor deposition, Optical alignment, Critical dimension metrology, Mass attenuation coefficient, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Optical lithography, Modulation, Manufacturing, Process control, Compact discs, Critical dimension metrology, 3D equipment, Line edge roughness, Photoresist processing, Semiconducting wafers, Edge roughness

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Antireflective coatings, Optical lithography, Metals, Capillaries, Copper, Interfaces, Coating, Photoresist materials, Process control, Semiconducting wafers, Photoresist developing, Back end of line

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Optical lithography, Data modeling, Calibration, Image processing, Remote sensing, Materials processing, SRAF, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Process modeling

Showing 5 of 30 publications
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