Dr. Kenichi Saito
Chief Specialist at NuFlare Technology Inc
SPIE Involvement:
Conference Program Committee | Author
Publications (9)

PROCEEDINGS ARTICLE | October 25, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Logic, Optical lithography, LCDs, Photomasks, Extreme ultraviolet, Electron beam melting, Line edge roughness

PROCEEDINGS ARTICLE | October 17, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Electron beams, Seaborgium, Amplifiers, LCDs, Photomasks, Beam shaping, Electron beam melting, Mask making, Data conversion

PROCEEDINGS ARTICLE | July 28, 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Electron beams, Logic, Amplifiers, LCDs, Objectives, Photomasks, Electron beam melting, Mask making, Vestigial sideband modulation

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Semiconductors, Electron beams, Electrodes, Manufacturing, Power supplies, Photomasks, Photomask technology, Temperature metrology, Protactinium, Current controlled current source

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Amplifiers, Data processing, Photomasks, Extreme ultraviolet lithography, Immersion lithography, Mask making, Data conversion, Data corrections, Data storage servers

PROCEEDINGS ARTICLE | May 11, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Monochromatic aberrations, Electron beams, Manufacturing, Control systems, Photomasks, Beam shaping, Electron beam melting, Line edge roughness, Photoresist processing, Standards development

Showing 5 of 9 publications
Conference Committee Involvement (3)
Photomask Technology 2015
29 September 2015 | Monterey, California, United States
Photomask Technology 2014
16 September 2014 | Monterey, California, United States
SPIE Photomask Technology
10 September 2013 | Monterey, California, United States
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