Richard Hou
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 13 March 2013 Paper
A. Kliner, Kai-Chung Hou, M. Plötner, Ch. Hupel, Th. Stelzner, T. Schreiber, R. Eberhardt, A. Tünnermann
Proceedings Volume 8616, 86160N (2013) https://doi.org/10.1117/12.2001984
KEYWORDS: Etching, Signal attenuation, Cladding, Fiber lasers, Polymers, Coating, Glasses, Crystals, Diodes, Light sources

Proceedings Article | 8 April 2011 Paper
Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Daniel Brown, Richard Sandstrom, Bruno La Fontaine, Alexander Bykanov, Georgiy Vaschenko, Oleh Khodykin, Norbert Böwering, Palash Das, Vladimir Fleurov, Kevin Zhang, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Silvia De Dea, Richard Hou, Wayne Dunstan, Peter Baumgart, Toshihiko Ishihara, Rod Simmons, Robert Jacques, Robert Bergstedt, David Brandt
Proceedings Volume 7969, 796933 (2011) https://doi.org/10.1117/12.882210
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Spectrometers, Light sources, Scanners, Optical filters, Reflectivity, Optical lithography, Laser applications

Proceedings Article | 7 April 2011 Paper
David Brandt, Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Richard Sandstrom, Bruno La Fontaine, Michael Lercel, Alexander Bykanov, Norbert Böwering, Georgiy Vaschenko, Oleh Khodykin, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Palash Das, Vladimir Fleurov, Kevin Zhang, Daniel Golich, Silvia De Dea, Richard Hou, Wayne Dunstan, Christian Wittak, Peter Baumgart, Toshihiko Ishihara, Rod Simmons, Robert Jacques, Robert Bergstedt
Proceedings Volume 7969, 79691H (2011) https://doi.org/10.1117/12.882208
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Reflectivity, Plasma, Mirrors, Semiconducting wafers, Carbon dioxide lasers, Laser scanners, 3D scanning

Proceedings Article | 23 March 2010 Paper
Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Richard Sandstrom, Norbert Böwering, Georgiy Vaschenko, Oleh Khodykin, Alexander Bykanov, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Daniel Golich, Silvia De Dea, Richard Hou, Kevin O'Brien, Wayne Dunstan, David Brandt
Proceedings Volume 7636, 763639 (2010) https://doi.org/10.1117/12.848408
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Carbon dioxide lasers, Reflectivity, Tin, Plasma, Manufacturing, Mirrors, Ions, Light sources

Proceedings Article | 20 March 2010 Paper
David Brandt, Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Richard Sandstrom, Norbert Böwering, Georgiy Vaschenko, Oleh Khodykin, Alexander Bykanov, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Daniel Golich, Silvia De Dea, Richard Hou, Kevin O'Brien, Wayne Dunstan
Proceedings Volume 7636, 76361I (2010) https://doi.org/10.1117/12.848404
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Scanners, Carbon dioxide lasers, Manufacturing, Prototyping, Tin, Mirrors, Laser scanners

Showing 5 of 9 publications
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