Richard Hou
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Publications (9)

PROCEEDINGS ARTICLE | March 13, 2013
Proc. SPIE. 8616, MOEMS and Miniaturized Systems XII
KEYWORDS: Light sources, Cladding, Signal attenuation, Etching, Polymers, Glasses, Crystals, Coating, Fiber lasers, Diodes

PROCEEDINGS ARTICLE | April 8, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Optical filters, Light sources, Optical lithography, Scanners, Spectrometers, Laser applications, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma

PROCEEDINGS ARTICLE | April 7, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Mirrors, Scanners, Reflectivity, Carbon dioxide lasers, Laser scanners, Extreme ultraviolet, Extreme ultraviolet lithography, 3D scanning, Semiconducting wafers, Plasma

PROCEEDINGS ARTICLE | March 23, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Mirrors, Light sources, Ions, Manufacturing, Reflectivity, Carbon dioxide lasers, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Mirrors, Scanners, Manufacturing, Carbon dioxide lasers, Laser scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Prototyping, Plasma, Tin

SPIE Journal Paper | October 1, 2009
JM3 Vol. 8 Issue 04
KEYWORDS: Extreme ultraviolet, Ions, Plasma, Gas lasers, Extreme ultraviolet lithography, Tin, Carbon monoxide, Mirrors, Prototyping, Light sources

Showing 5 of 9 publications
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