Dr. Kai Dirscherl
at Danish Fundamental Metrology Institut
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | April 5, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Metrology, Polarization, Sensors, Silicon, Atomic force microscopy, Scanning electron microscopy, Scatterometry, Photomasks, Critical dimension metrology, Scatter measurement

PROCEEDINGS ARTICLE | April 5, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Electron beams, Metrology, Scattering, Image acquisition, Computer simulations, Scanning electron microscopy, Monte Carlo methods, Optical simulations, Convolution, Critical dimension metrology

PROCEEDINGS ARTICLE | November 9, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Deep ultraviolet, Opacity, Calibration, Ultraviolet radiation, Microscopy, Chromium, Scanning electron microscopy, Photomasks, Critical dimension metrology, Standards development

PROCEEDINGS ARTICLE | November 20, 2003
Proc. SPIE. 5190, Recent Developments in Traceable Dimensional Measurements II
KEYWORDS: Nanotechnology, Calibration, Image processing, Inspection, Image analysis, Data acquisition, 3D metrology, Scanning probe microscopy, Scanning tunneling microscopy, Scanning probe microscopes

PROCEEDINGS ARTICLE | November 20, 2003
Proc. SPIE. 5190, Recent Developments in Traceable Dimensional Measurements II
KEYWORDS: Mirrors, Clocks, Interferometers, Scanners, Control systems, Atomic force microscopy, Head, Feedback loops, Feedback control, Scanning probe microscopes

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top