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Kaixin Yuan
at Fine Optical Engineering Reasearch Ctr
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Publications (1)
Proceedings Article | 16 December 2022 Presentation + Paper
Properties of femtosecond laser modified atomic layer deposition SiO2 films and their resistance to nanosecond ultraviolet lasers
Proceedings Volume 12312, 1231208 (2022) https://doi.org/10.1117/12.2646242
KEYWORDS: Thin films, Femtosecond phenomena, Atomic layer deposition, Laser induced damage, Silica, Resistance, Absorption, Silicon, Ultraviolet radiation, Luminescence
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