Dr. Kang-Hoon Choi
at LFoundry GmbH
SPIE Involvement:
Area of Expertise:
Electron Beam Lithography and Nanofabrications , Proximity Effect Correction & Data Preparation , Electron Beam Resist Process Development and Optimization , E-Beam Lithography Tool Optimization and its Performance Characterization , SEM based CD Metrology
Publications (28)

Proceedings Article | 23 October 2015 Paper
Proceedings Volume 9635, 963515 (2015) https://doi.org/10.1117/12.2197175
KEYWORDS: Point spread functions, Critical dimension metrology, Algorithm development, Scattering, Calibration, Cadmium sulfide, Computer simulations, Semiconducting wafers, Photovoltaics, Electron beams

Proceedings Article | 19 March 2015 Paper
Christoph Hohle, Kang-Hoon Choi, Norbert Hanisch, Manuela Gutsch, Robert Seidel, Katja Steidel, Xaver Thrun, Thomas Werner
Proceedings Volume 9423, 94231B (2015) https://doi.org/10.1117/12.2087612
KEYWORDS: Metals, Semiconducting wafers, Electron beam lithography, Etching, Electron beam direct write lithography, Photomasks, Optical alignment, Wafer-level optics, Back end of line, Electron beams

Proceedings Article | 17 October 2014 Paper
Kang-Hoon Choi, Norbert Hanisch, Christoph Hohle, Robert Seidel, Katja Steidel, Xaver Thrun, Thomas Werner, Manuela Gutsch
Proceedings Volume 9231, 92310F (2014) https://doi.org/10.1117/12.2067884
KEYWORDS: Metals, Etching, Semiconducting wafers, Optical alignment, Electron beam direct write lithography, Photomasks, Back end of line, Electron beam lithography, Scanning electron microscopy, Electron beams

Proceedings Article | 8 October 2014 Paper
Proceedings Volume 9235, 92350U (2014) https://doi.org/10.1117/12.2066156
KEYWORDS: Chromium, Electron beam lithography, Data corrections, Cadmium, Beam shaping, Neodymium, Lithography, Photoresist processing, Photomasks, Critical dimension metrology

Proceedings Article | 1 October 2013 Paper
Proceedings Volume 8886, 88860F (2013) https://doi.org/10.1117/12.2030664
KEYWORDS: Semiconducting wafers, Calibration, Point spread functions, Reticles, Electron beam lithography, Mathematical modeling, Chemical mechanical planarization, Modulation, Forward error correction, Metrology

Showing 5 of 28 publications
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