Dr. Kang-Hoon Choi
at LFoundry GmbH
SPIE Involvement:
Author
Area of Expertise:
Electron Beam Lithography and Nanofabrications , Proximity Effect Correction & Data Preparation , Electron Beam Resist Process Development and Optimization , E-Beam Lithography Tool Optimization and its Performance Characterization , SEM based CD Metrology
Websites:
Publications (28)

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Photovoltaics, Point spread functions, Electron beams, Scattering, Calibration, Computer simulations, Cadmium sulfide, Critical dimension metrology, Algorithm development, Semiconducting wafers

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Wafer-level optics, Electron beam lithography, Electron beams, Etching, Metals, Photomasks, Optical alignment, Electron beam direct write lithography, Semiconducting wafers, Back end of line

PROCEEDINGS ARTICLE | October 17, 2014
Proc. SPIE. 9231, 30th European Mask and Lithography Conference
KEYWORDS: Electron beam lithography, Electron beams, Etching, Metals, Scanning electron microscopy, Photomasks, Optical alignment, Electron beam direct write lithography, Semiconducting wafers, Back end of line

PROCEEDINGS ARTICLE | October 8, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Lithography, Electron beam lithography, Cadmium, Chromium, Photomasks, Beam shaping, Critical dimension metrology, Neodymium, Photoresist processing, Data corrections

PROCEEDINGS ARTICLE | October 1, 2013
Proc. SPIE. 8886, 29th European Mask and Lithography Conference
KEYWORDS: Mathematical modeling, Electron beam lithography, Point spread functions, Reticles, Metrology, Modulation, Calibration, Forward error correction, Semiconducting wafers, Chemical mechanical planarization

PROCEEDINGS ARTICLE | September 23, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Electron beam lithography, Point spread functions, Metrology, Data modeling, Opacity, Calibration, Error analysis, Semiconducting wafers, Statistical modeling, Process modeling

Showing 5 of 28 publications
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