Dr. Kangmin Hsia
Senior Engineer at Intel Corp
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Thin films, Reticles, Metrology, Distortion, Image registration, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Thin film deposition, Personal protective equipment

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Optical lithography, Etching, Image processing, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium, Defect inspection

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Metrology, Optical lithography, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Mask making, Standards development

PROCEEDINGS ARTICLE | July 19, 2000
Proc. SPIE. 4066, Photomask and Next-Generation Lithography Mask Technology VII
KEYWORDS: Reticles, Deep ultraviolet, Imaging systems, Databases, Manufacturing, Inspection, Computing systems, Photomasks, Optical proximity correction, Double positive medium

PROCEEDINGS ARTICLE | September 1, 1991
Proc. SPIE. 1497, Nonlinear Optics and Materials

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