Kaoru Koike
Researcher at Sony Atsugi Technology Ctr
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 21 March 2007
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Semiconductors, Lithography, Statistical analysis, Ions, Manufacturing, Distortion, Transistors, Optical proximity correction, Semiconducting wafers, Process modeling

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Lithography, Ions, Distortion, Design for manufacturing, Photomasks, Transistors, Optical proximity correction, Semiconducting wafers, Device simulation, Design for manufacturability

Proceedings Article | 23 March 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Metrology, Image processing, Silicon, Process control, Photomasks, Mask making, Optical alignment, Reactive ion etching, Photoresist processing, Semiconducting wafers

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Electron beam lithography, Reticles, Metrology, Silicon, Distortion, Photomasks, Optical alignment, Semiconducting wafers, Data corrections, Overlay metrology

Proceedings Article | 6 May 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Lithography, Electron beam lithography, Metals, Scanners, Copper, Resistance, Scanning electron microscopy, Transmission electron microscopy, Overlay metrology, Chemical mechanical planarization

Showing 5 of 12 publications
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