Kaoru Koike
Researcher at Sony Atsugi Technology Ctr
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 21 March 2007 Paper
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Transistors, Optical proximity correction, Ions, Distortion, Process modeling, Lithography, Semiconducting wafers, Manufacturing, Semiconductors, Statistical analysis

Proceedings Article | 20 May 2006 Paper
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Transistors, Optical proximity correction, Ions, Distortion, Semiconducting wafers, Lithography, Design for manufacturability, Device simulation, Photomasks, Design for manufacturing

Proceedings Article | 23 March 2006 Paper
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Photomasks, Semiconducting wafers, Metrology, Photoresist processing, Mask making, Optical alignment, Image processing, Silicon, Process control, Reactive ion etching

Proceedings Article | 28 June 2005 Paper
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Reticles, Distortion, Semiconducting wafers, Photomasks, Silicon, Metrology, Electron beam lithography, Optical alignment, Data corrections, Overlay metrology

Proceedings Article | 6 May 2005 Paper
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Metals, Transmission electron microscopy, Lithography, Scanners, Copper, Scanning electron microscopy, Resistance, Electron beam lithography, Overlay metrology, Chemical mechanical planarization

Showing 5 of 12 publications
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