Prof. Kaoru Ohya
Professor at Tokushima University
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Nanostructuring, Sputter deposition, Microscopy, Crystals, Ions, Silicon, Monte Carlo methods, Ion beams, Extreme ultraviolet lithography, Neon, Molybdenum, Selenium, Gallium

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Oxides, Multilayers, Metrology, Contamination, Defect detection, Metals, Crystals, Inspection, Monte Carlo methods, Image quality, Photomasks, Extreme ultraviolet, Selenium, Ruthenium

PROCEEDINGS ARTICLE | June 3, 2010
Proc. SPIE. 7729, Scanning Microscopy 2010
KEYWORDS: Microscopes, Silica, Chemical species, Particles, Ions, Scanning electron microscopy, Monte Carlo methods, Ion beams, Selenium, Gallium

PROCEEDINGS ARTICLE | March 24, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Electron beams, Ions, Silicon, Scanning electron microscopy, Scanning helium ion microscopy, Monte Carlo methods, Ion beams, Helium, Selenium, Gallium

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Electron beams, Defect detection, Silica, Particles, Silicon, Scanning electron microscopy, Monte Carlo methods, Selenium, Electron transport, Defect inspection

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