Karen Huang
at JSR Micro Inc
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 27, 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Lithography, Optical lithography, Etching, Coating, Photoresist materials, Line width roughness, Double patterning technology, Photoresist processing, Semiconducting wafers, Plasma

PROCEEDINGS ARTICLE | March 19, 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Lithography, Polymers, Silicon, Reflectivity, Chromophores, Silicon films, Solids, Critical dimension metrology, Semiconducting wafers, Bottom antireflective coatings

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