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Dr. Karen Martirosyan
at HPL Technologies Inc
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 5 May 2005 Paper
Device and lithography contextual mask rule generation
Young Mog Ham, Brian Dillon, Chris Progler, Kory Goldammer, Zhiziang Jin, Gary Green, R. Scott Mackay, Hitendra Divecha, Victor Boksha, Pat Martin, Mitch Heins, Yuan Zhang, Kurt Davis, Rafik Marutyan, Karen Martirosyan, Sergei Bakarian
Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.600730
KEYWORDS: Photomasks, Semiconducting wafers, Optical proximity correction, Lithography, Critical dimension metrology, Manufacturing, Resolution enhancement technologies, Electron beam lithography, Mask making, Design for manufacturing
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