Dr. Karen Martirosyan
at HPL Technologies Inc
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | May 5, 2005
Proc. SPIE. 5756, Design and Process Integration for Microelectronic Manufacturing III
KEYWORDS: Lithography, Electron beam lithography, Manufacturing, Design for manufacturing, Photomasks, Optical proximity correction, Mask making, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

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