Dr. Karen E. Petrillo
Advisory Engineer/Assignee from IBM at IBM Corp
SPIE Involvement:
Author
Publications (82)

PROCEEDINGS ARTICLE | March 28, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Electron beam lithography, Defect detection, Modulation, Etching, Coating, Inspection, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Stochastic processes

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Optical lithography, Contamination, Coating, Manufacturing, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Optical lithography, Defect detection, Air contamination, Composites, Coating, Manufacturing, Inspection, Laser scattering, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Carbon, Polymers, Reactive ion etching, Semiconducting wafers

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Optical lithography, Etching, Metals, Interfaces, Silicon, Quantum efficiency, Materials processing, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Oxides, Lithography, Optical lithography, Etching, Ions, Extreme ultraviolet, Extreme ultraviolet lithography, Neodymium

Showing 5 of 82 publications
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