Karen E. Petrillo
Advisory Engineer/Assignee from IBM at IBM Thomas J Watson Research Ctr
SPIE Involvement:
Author
Publications (90)

SPIE Journal Paper | 1 July 2020
JM3 Vol. 19 Issue 03
KEYWORDS: Stochastic processes, Fiber optic illuminators, Line edge roughness, Critical dimension metrology, Defect inspection, Extreme ultraviolet, Inspection, Optical lithography, Yield improvement

Proceedings Article | 6 April 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Amorphous silicon, Lithography, Optical lithography, Etching, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness, Oxidation

Proceedings Article | 24 March 2020 Presentation
Proc. SPIE. 11326, Advances in Patterning Materials and Processes XXXVII

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Optical lithography, Etching, Inspection, Bridges, Extreme ultraviolet, Critical dimension metrology, Line edge roughness, Stochastic processes, Defect inspection

Proceedings Article | 20 March 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Metrology, Calibration, Atomic force microscopy, Scanning electron microscopy, Scatterometry, Extreme ultraviolet, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Stochastic processes

Showing 5 of 90 publications
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