Karen E. Petrillo
Advisory Engineer/Assignee from IBM at IBM Corp
SPIE Involvement:
Author
Publications (84)

PROCEEDINGS ARTICLE | October 19, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Optical lithography, Coating, Manufacturing, Extreme ultraviolet, Extreme ultraviolet lithography

SPIE Journal Paper | September 5, 2018
JM3 Vol. 18 Issue 01
KEYWORDS: Inspection, Semiconducting wafers, Stochastic processes, Extreme ultraviolet, Etching, Defect detection, Electron beam lithography, Modulation, Coating, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | March 28, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Electron beam lithography, Defect detection, Modulation, Etching, Coating, Inspection, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Stochastic processes

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Optical lithography, Contamination, Coating, Manufacturing, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Optical lithography, Defect detection, Air contamination, Composites, Coating, Manufacturing, Inspection, Laser scattering, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Carbon, Polymers, Reactive ion etching, Semiconducting wafers

Showing 5 of 84 publications
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