Karim M. Moamen
IC Design Consultant at Mentor Graphics Egypt
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 19 May 2011
Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII
KEYWORDS: Lithography, Optical lithography, Visualization, Databases, Silicon, Scanning electron microscopy, Nonlinear optics, Photomasks, Optical proximity correction, Semiconducting wafers

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