Karl Schumacher
at GLOBALFOUNDRIES Dresden Module One LLC & Co KG
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 20 October 2016
Proc. SPIE. 10032, 32nd European Mask and Lithography Conference
KEYWORDS: Semiconductors, Lithography, Error analysis, Manufacturing, Control systems, Scanning electron microscopy, Process control, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Semiconductors, Lithography, Error analysis, Optical alignment, Neodymium, Error control coding, Semiconducting wafers, Tolerancing, Overlay metrology, Nonlinear control

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Metrology, Deep ultraviolet, Etching, Manufacturing, Photoresist materials, Photomasks, Semiconductor manufacturing, Semiconducting wafers, 193nm lithography

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Monochromatic aberrations, Reticles, Lithographic illumination, Etching, Scanners, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 16 July 2002
Proc. SPIE. 4689, Metrology, Inspection, and Process Control for Microlithography XVI
KEYWORDS: Oxides, Diffraction, Polishing, Metrology, Sensors, Image processing, Optical alignment, Photoresist processing, Semiconducting wafers, Overlay metrology

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