Karla A. Romero
at AMD Saxony Mfg GmbH
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 21 March 2007
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Lithography, Etching, Chemistry, Manufacturing, Optical proximity correction, Line edge roughness, Chlorine, Fluorine, Semiconducting wafers, Bromine

Proceedings Article | 13 March 2006
Proc. SPIE. 6156, Design and Process Integration for Microelectronic Manufacturing IV
KEYWORDS: Monochromatic aberrations, Optical lithography, Etching, Image processing, Scanners, Transistors, Critical dimension metrology, Line edge roughness, Structural design, Semiconducting wafers

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