Dr. Karmen Yung
at Intel Corp
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Etching, Plasma, Plasma etching, Resolution enhancement technologies, Chromium, Photomasks, Reliability, Phase shifts, Process control, Ions

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Photomasks, Optical lithography, Glasses, Image resolution, Chromium, Etching, 3D modeling, Electron beam lithography, Defect inspection, Semiconducting wafers

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Photomasks, Optical lithography, Glasses, Semiconducting wafers, SRAF, Cadmium, Phase shifts, Modulation, Image transmission, Etching

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Etching, Photomasks, Oxygen, Chromium, Critical dimension metrology, Plasma, Plasma treatment, Nitrogen, Plasma etching, Manufacturing

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Data modeling, Performance modeling, Process modeling, Reticles, Etching, Sensors, Metrology, Critical dimension metrology, Manufacturing, Data processing

Showing 5 of 6 publications
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