Dr. Karmen Yung
at Intel Corp
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 8 November 2012 Paper
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Etching, Ions, Reliability, Chromium, Process control, Photomasks, Plasma etching, Resolution enhancement technologies, Plasma, Phase shifts

Proceedings Article | 7 March 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Electron beam lithography, Optical lithography, Etching, Glasses, Image resolution, Chromium, 3D modeling, Photomasks, Semiconducting wafers, Defect inspection

Proceedings Article | 7 March 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Optical lithography, Cadmium, Modulation, Etching, Glasses, Image transmission, Photomasks, SRAF, Semiconducting wafers, Phase shifts

Proceedings Article | 30 October 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Etching, Nitrogen, Manufacturing, Chromium, Oxygen, Photomasks, Plasma etching, Critical dimension metrology, Plasma treatment, Plasma

Proceedings Article | 5 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Reticles, Metrology, Data modeling, Sensors, Etching, Manufacturing, Data processing, Critical dimension metrology, Performance modeling, Process modeling

Showing 5 of 6 publications
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