Dr. Karsten Bubke
R&D Engineer at GlobalFoundries
SPIE Involvement:
Publications (25)

Proceedings Article | 14 October 2011 Paper
Guoxiang Ning, Christian Holfeld, Anna Tchikoulaeva, Martin Sczyrba, Angeline Ho, Karsten Bubke, Soon Yoeng Tan, Andre Holfeld, Byoung Il Choi
Proceedings Volume 8166, 81664D (2011) https://doi.org/10.1117/12.899127
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Reticles, Particles, Photomasks, Inspection, Glasses, Defect detection, Manufacturing, Metals

Proceedings Article | 2 April 2011 Paper
Holger Bald, Rolf Seltmann, Karsten Bubke, Matthias Ruhm, Marc Noot, Dieter Woischke, Paul van Adrichem, Paul Luehrmann
Proceedings Volume 7985, 79850J (2011) https://doi.org/10.1117/12.886120
KEYWORDS: Scanners, Scatterometry, Scanning electron microscopy, Semiconducting wafers, Optical proximity correction, Time metrology, Metrology, High volume manufacturing, Cadmium sulfide, Cadmium

Proceedings Article | 23 March 2011 Paper
Karsten Bubke, Matthias Ruhm, Rafael Aldana, Martin Niehoff, Xu Xie, Justin Ghan, Paul van Adrichem, Holger Bald, Paul Luehrmann, Stefan Roling, Rolf Seltmann
Proceedings Volume 7973, 79732E (2011) https://doi.org/10.1117/12.890501
KEYWORDS: Data modeling, Scanners, Scatterometry, Scanning electron microscopy, Metrology, Critical dimension metrology, Semiconducting wafers, Printing, Imaging systems, Cadmium

SPIE Journal Paper | 1 January 2011
JM3, Vol. 10, Issue 1, 013009, (January 2011) https://doi.org/10.1117/12.10.1117/1.3541779
KEYWORDS: Pellicles, Semiconducting wafers, Critical dimension metrology, Reticles, Apodization, Lithography, Photomasks, Transmittance, Optical proximity correction, Phase shifts

Proceedings Article | 23 March 2010 Paper
Proceedings Volume 7636, 76361Y (2010) https://doi.org/10.1117/12.847269
KEYWORDS: Reticles, Contamination, Reflectivity, Extreme ultraviolet lithography, Extreme ultraviolet, Chemical analysis, Carbon, Raman spectroscopy, Spectroscopy, Thin films

Showing 5 of 25 publications
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