Dr. Karsten Bubke
R&D Engineer at GLOBALFOUNDRIES Dresden Module Two GmbH & Co KG
SPIE Involvement:
Author
Publications (25)

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Reticles, Defect detection, Metals, Glasses, Particles, Manufacturing, Inspection, Photomasks, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | April 2, 2011
Proc. SPIE. 7985, 27th European Mask and Lithography Conference
KEYWORDS: Metrology, Cadmium, Scanners, Scanning electron microscopy, Scatterometry, Time metrology, Cadmium sulfide, Optical proximity correction, High volume manufacturing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Metrology, Cadmium, Data modeling, Imaging systems, Scanners, Scanning electron microscopy, Printing, Scatterometry, Critical dimension metrology, Semiconducting wafers

SPIE Journal Paper | January 1, 2011
JM3 Vol. 10 Issue 1
KEYWORDS: Pellicles, Semiconducting wafers, Critical dimension metrology, Reticles, Apodization, Lithography, Photomasks, Transmittance, Optical proximity correction, Phase shifts

PROCEEDINGS ARTICLE | March 23, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Carbon, Thin films, Reticles, Contamination, Spectroscopy, Reflectivity, Raman spectroscopy, Extreme ultraviolet, Chemical analysis, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Carbon, Reticles, Contamination, Curium, Silicon, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Tantalum, Semiconducting wafers

Showing 5 of 25 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top