Karsten Gutjahr
Technical Staff at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Scatterometry, Process control, Overlay metrology

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Optical filters, Metrology, Polarization, Inspection, Scatterometry, Process control, Modeling and simulation, Semiconducting wafers, Overlay metrology

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Reticles, Metrology, Scanners, Extreme ultraviolet, High volume manufacturing, Optical alignment, Optimization (mathematics), Semiconducting wafers, HVAC controls, Overlay metrology

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Defense and security, Diffraction, Metrology, Image processing, Image analysis, Scatterometry, Environmental sensing, Overlay metrology, Chemical mechanical planarization, Diffraction gratings

Proceedings Article | 24 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Photovoltaics, Metrology, Diffractive optical elements, Detection and tracking algorithms, Optical properties, Etching, Scatterometry, Signal processing, Semiconducting wafers, Overlay metrology

Showing 5 of 13 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top