Dr. Kateryna Lyakhova
Sr Project Leader at ASML Netherlands BV
SPIE Involvement:
Publications (5)

Proceedings Article | 27 April 2023 Presentation + Paper
Proceedings Volume 12496, 124960N (2023) https://doi.org/10.1117/12.2658274
KEYWORDS: Scanners, Overlay metrology, Semiconducting wafers, Lithography, Metrology, Dysprosium, Distributed interactive simulations, Design and modelling, Critical dimension metrology, Yield improvement

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11609, 116090T (2021) https://doi.org/10.1117/12.2583800

Proceedings Article | 26 September 2019 Presentation + Paper
Proceedings Volume 11147, 111470E (2019) https://doi.org/10.1117/12.2537104
KEYWORDS: Diffraction, Extreme ultraviolet lithography, Metals, Photomasks, Semiconducting wafers, Nanoimprint lithography, Optical proximity correction, Extreme ultraviolet, Phase modulation, Phase shift keying

Proceedings Article | 3 October 2018 Presentation + Paper
Proceedings Volume 10809, 108090N (2018) https://doi.org/10.1117/12.2503321
KEYWORDS: Source mask optimization, Semiconducting wafers, Scanners, Logic, Extreme ultraviolet lithography, Reticles, Extreme ultraviolet

Proceedings Article | 18 March 2016 Paper
Proceedings Volume 9776, 97761S (2016) https://doi.org/10.1117/12.2220025
KEYWORDS: Neodymium, Photomasks, Semiconducting wafers, Extreme ultraviolet, Image processing, Lithography, Lithographic illumination, Extreme ultraviolet lithography, Optical proximity correction, Atrial fibrillation, Reticles, Printing, Deep ultraviolet

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