Dr. Kathleen Nafus
Process Engineering Manager at Tokyo Electron Kyushu Ltd
SPIE Involvement:
Author
Publications (69)

Proceedings Article | 30 March 2020
Proc. SPIE. 11326, Advances in Patterning Materials and Processes XXXVII
KEYWORDS: Optical lithography, Ultraviolet radiation, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Stochastic processes, Absorption

Proceedings Article | 23 March 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Etching, Photoresist materials, Bridges, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Stochastic processes

Proceedings Article | 7 October 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Lithography, Scanners, Silicon, Inspection, Bridges, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Stochastic processes

Proceedings Article | 8 April 2019
Proc. SPIE. 10960, Advances in Patterning Materials and Processes XXXVI
KEYWORDS: Switching, Calibration, 3D modeling, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Stochastic processes

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Scanners, Particles, Coating, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Stochastic processes

Showing 5 of 69 publications
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