Dr. Katja Steidel
Lead Engineer at Advanced Mask Technology Ctr GmbH Co KG
Publications (6)

PROCEEDINGS ARTICLE | October 3, 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Thin films, Electron beam lithography, Electron beams, Electrons, Materials processing, Scatterometry, Photomasks, Optical proximity correction, Critical dimension scanning electron microscopy, Critical dimension metrology, Photoresist processing

PROCEEDINGS ARTICLE | March 8, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Semiconductors, Electron beam lithography, Electron beams, Sensors, Metals, Image processing, Electrons, Inspection, Scanning electron microscopy, Wafer inspection, Semiconducting wafers, Tin, Defect inspection

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Wafer-level optics, Electron beam lithography, Electron beams, Etching, Metals, Photomasks, Optical alignment, Electron beam direct write lithography, Semiconducting wafers, Back end of line

PROCEEDINGS ARTICLE | October 17, 2014
Proc. SPIE. 9231, 30th European Mask and Lithography Conference
KEYWORDS: Electron beam lithography, Electron beams, Etching, Metals, Scanning electron microscopy, Photomasks, Optical alignment, Electron beam direct write lithography, Semiconducting wafers, Back end of line

PROCEEDINGS ARTICLE | March 29, 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Electron beam lithography, Point spread functions, Titanium, Scattering, Metals, Silicon, Aluminum, Neodymium, Semiconducting wafers, System on a chip

PROCEEDINGS ARTICLE | March 26, 2013
Proc. SPIE. 8680, Alternative Lithographic Technologies V
KEYWORDS: Oxides, Electron beam lithography, Metals, Copper, Dielectrics, Resistance, Capacitance, Transistors, Semiconducting wafers, Back end of line

Showing 5 of 6 publications
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