Dr. Katja Viatkina
Research Engineer at ASML Netherlands BV
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 20 March 2019
Proc. SPIE. 10963, Advanced Etch Technology for Nanopatterning VIII
KEYWORDS: Lithography, Metrology, Optical lithography, Etching, Scanners, Process control, Critical dimension metrology, Semiconducting wafers, Overlay metrology, Plasma

Proceedings Article | 24 March 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Etching, Photomasks, Extreme ultraviolet, Plasma enhanced chemical vapor deposition, Plasma etching, Extreme ultraviolet lithography, High volume manufacturing, Reactive ion etching, Stochastic processes, Focus stacking software

Proceedings Article | 24 March 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithography, Metrology, Optical lithography, Etching, Scanners, Ions, Atomic force microscopy, Immersion lithography, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Proceedings Article | 15 March 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Metrology, Logic, Optical lithography, Etching, Scanners, Scatterometry, Process control, Photomasks, Plasma etching, Critical dimension metrology

Proceedings Article | 20 March 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Oxides, Metrology, Etching, Polymers, Scanning electron microscopy, Photomasks, Wet etching, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

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