Mr. Katsuhiko Horii
at HOYA Corp
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Etching, Dry etching, Ultraviolet radiation, Coating, Resistance, Chromium, Scanning electron microscopy, Photomasks, Fluorine, Photoresist processing

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Optical lithography, Etching, Diffusion, Chromium, Scanning electron microscopy, Photomasks, SRAF, Photoresist processing, Standards development, Chemically amplified resists

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