Dr. Katsuhiko Murakami Profile

Dr. Katsuhiko Murakami

Visiting Professor at Osaka Univ

SPIE Involvement:

Author

Publications (54)

Proceedings Article | 23 March 2012 Paper

Paper

Development of EUV lithography tool technologies at Nikon

Hiroyuki Kondo, Takuro Ono, Masayuki Shiraishi, Atsushi Yamazaki, Takashi Yamaguchi, Noriaki Kandaka, Hiroshi Chiba, Yoshio Kawabe, Katsuhiko Murakami, Tetsuya Oshino, Ryo Shibata

Proceedings Volume 8322, 832215 (2012) https://doi.org/10.1117/12.917676

KEYWORDS: Extreme ultraviolet lithography, Mirrors, Contamination, Extreme ultraviolet, Multilayers, Reflectivity, Carbon, Silicon, Apodization, Oxidation

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Proceedings Article | 6 April 2011 Paper

Paper

A simple modeling of carbon contamination on EUV exposure tools based on contamination experiments with synchrotron source

T. Oshino, T. Yamaguchi, N. Kandaka, M. Shiraishi, K. Murakami, A. Yamazaki

Proceedings Volume 7969, 79690N (2011) https://doi.org/10.1117/12.879392

KEYWORDS: Contamination, Extreme ultraviolet, Oxygen, Photons, Carbon, Mirrors, Reflectivity, Protactinium, Molecules, Chemical species

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Proceedings Article | 5 April 2011 Paper

Paper

Development of EUV lithography tools at Nikon

Hiroshi Chiba, Katsuhiko Murakami, Yoshiaki Kohama, Yukiharu Ohkubo, Hiroyuki Kondo, Kenji Morita, Hidemi Kawai, Tetsuya Oshino, Kazushi Nomura, Kazunari Hada

Proceedings Volume 7969, 79690P (2011) https://doi.org/10.1117/12.879305

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Contamination, Mirrors, Carbon, Synchrotrons, Wavefront metrology, Oxygen, Optical design, Transmittance

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Proceedings Article | 23 March 2010 Paper

Paper

Flare modeling and calculation on EUV optics

K. Murakami, T. Oshino, M. Shiraishi, H. Chiba

Proceedings Volume 7636, 763629 (2010) https://doi.org/10.1117/12.846472

KEYWORDS: Point spread functions, Mirrors, Semiconducting wafers, Light scattering, Multilayers, Extreme ultraviolet, Surface roughness, Wafer-level optics, Spatial frequencies, Reflectivity

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Proceedings Article | 23 March 2010 Paper

Paper

Contamination study on EUV exposure tools using SAGA light source (SAGA-LS)

S. Matsunari, T. Aoki, S. Kawata, A. Yamazaki, M. Shiraishi, K. Murakami, T. Yamaguchi, N. Kandaka

Proceedings Volume 7636, 76361U (2010) https://doi.org/10.1117/12.846676

KEYWORDS: Contamination, Extreme ultraviolet lithography, Extreme ultraviolet, Reflectivity, Mirrors, Carbon, Synchrotrons, Alternate lighting of surfaces, Protactinium, Light sources

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Proceedings Article | 20 March 2010 Paper

Paper

Nikon EUVL development progress update

Takaharu Miura, Kenji Morita, Katsuhiko Murakami, Kazunari Hada, Yukiharu Ohkubo, Yoshiaki Kohama, Hidemi Kawai

Proceedings Volume 7636, 76361G (2010) https://doi.org/10.1117/12.846459

KEYWORDS: Extreme ultraviolet lithography, Projection systems, Mirrors, Extreme ultraviolet, Lithography, Light sources, Carbon, Reflectivity, Lithographic illumination, Coating

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SPIE Journal Paper | 1 October 2009

Development progress of optics for extreme ultraviolet lithography at Nikon

Katsuhiko Murakami, Tetsuya Oshino, Hiroyuki Kondo, Masayuki Shiraishi, Hiroshi Chiba, Hideki Komatsuda, Kazushi Nomura, Jin Nishikawa

JM3, Vol. 8, Issue 04, 041507, (October 2009) https://doi.org/10.1117/12.10.1117/1.3238522

KEYWORDS: Projection systems, Extreme ultraviolet lithography, Mirrors, Extreme ultraviolet, Wavefronts, EUV optics, Resolution enhancement technologies, Multilayers, Reflectivity, Lithographic illumination

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Proceedings Article | 18 March 2009 Paper

Paper

Development progress of optics for EUVL at Nikon

Masayuki Shiraishi, Tetsuya Oshino, Katsuhiko Murakami, Hiroyuki Kondo, Hideki Komatsuda, Jin Nishikawa, Hiroshi Chiba, Kazushi Nomura

Proceedings Volume 7271, 72711Z (2009) https://doi.org/10.1117/12.813638

KEYWORDS: Projection systems, Mirrors, Extreme ultraviolet lithography, Extreme ultraviolet, Wavefronts, Eye, Resolution enhancement technologies, Reflectivity, Polishing, Aspheric optics

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Proceedings Article | 18 March 2009 Paper

Paper

Durability of capped multilayer mirrors for high volume manufacturing extreme ultraviolet lithography tool

K. Murakami, T. Aoki, S. Kawata, S. Matsunari, Y. Kakutani

Proceedings Volume 7271, 72713R (2009) https://doi.org/10.1117/12.813640

KEYWORDS: Mirrors, Reflectivity, Extreme ultraviolet, Ions, Silicon, Light sources, Extreme ultraviolet lithography, Metals, Titanium dioxide, Oxidation

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Proceedings Article | 18 March 2009 Paper

Paper

Nikon EUVL development progress update

Yoshiaki Kohama, Katsuhiko Murakami, Kazunari Hada, Hidemi Kawai, Kenji Morita, Takaharu Miura, Yukiharu Ohkubo

Proceedings Volume 7271, 72711X (2009) https://doi.org/10.1117/12.813384

KEYWORDS: Extreme ultraviolet lithography, Projection systems, Extreme ultraviolet, Carbon, Mirrors, Light sources, Wavefronts, Lithography, Photomasks, Contamination control

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Proceedings Article | 4 December 2008 Paper

Paper

Development of EUV lithography tools at Nikon

Kenji Morita, Yoshiaki Kohama, Takaharu Miura, Tetsuya Oshino, Yukiharu Ohkubo, Hiroshi Chiba, Hidemi Kawai, Kazunari Hada, Hiroyuki Kondo, Katsuhiko Murakami, Kazushi Nomura

Proceedings Volume 7140, 71401C (2008) https://doi.org/10.1117/12.804706

KEYWORDS: Projection systems, Extreme ultraviolet lithography, Mirrors, Extreme ultraviolet, Wavefronts, Lithography, Polishing, Aspheric optics, Multilayers, Optical design

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Proceedings Article | 26 March 2008 Paper

Paper

Nikon EUVL development progress update

Katsuhiko Murakami, Yukiharu Ohkubo, Kenji Morita, Takaharu Miura, Kazuaki Suzuki, Kazunari Hada, Yoshiaki Kohama, Hidemi Kawai

Proceedings Volume 6921, 69210M (2008) https://doi.org/10.1117/12.772444

KEYWORDS: Extreme ultraviolet lithography, Projection systems, Reflectivity, Light sources, EUV optics, Photomasks, Extreme ultraviolet, Lithography, Reticles, Line edge roughness

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Extreme Ultra Violet Lithography (EUVL) has been widely regarded as the lithography technology to succeed optical lithography. It is now considered as one of the most promising technologies below hp45nm node [1], following ArF immersion lithography considering trend of achievable process K1 factors. In this paper we would like to present our significant progress on the development of EUV exposure tool. There are several key important areas which should be developed to realize EUVL to be feasible, such as reflective mask, resist, and tool itself. The reflective mask features such characteristics as pellicle-less, ultra-smooth blank flatness and defect free. The resist should be of high sensitivity and small line edge roughness (LER) as well as fine resolution. EUV exposure tool itself consists of major modules such as EUV light source, projection optics, vacuum body, vacuum stages, and so on. Nikon has developed new polishing technologies such as ion-beam figuring and elastic emission machining, and new ultra high-precision interferometers for aspheric surface metrology. Our multi-layer coating technology has been also improved. High reflective Mo/Si multi layer coating has been successfully achieved and irradiation tests using synchrotron radiation have been conducted. Successful achievement of those developments enables us to produce full-field projection optics for EUVL process development tool called EUV1. The proto-type development of full-field projection optics has been successfully completed and its technical achievement has reflected into production optics. Preparation of complete set of production and metrology tools necessary for projection optics production was completed and all tools are now in full operation. Nikon has already developed dual pod reticle carrier for EUV1 tool. In parallel Nikon has been developing the same concept carrier for HVM in cooperation with Canon and Entegris. Regarding to EUV1 tool development, all modules of EUV1 such as full-field projection optics module, illumination optics module, vacuum body module, vacuum compatible reticle/wafer stage modules, reticle/wafer loader modules, EUV light source module have been completed. Nikon has already started EUV1 module installation process and the module level function and basic performance have been being checked. Nikon will complete module integration to achieve the first exposure result. Some development results will be shown which lead to confidence for realization of EUVL. Nikon also would like to announce that development of 1st generation production EUVL tool named EUV2 has been studied.

Proceedings Article | 21 March 2008 Paper

Paper

EUV wavefront measurement of six-mirror optics using EWMS

K. Sugisaki, H. Yokota, K. Murakami, C. Ouchi, T. Hasegawa, M. Okada, K. Otaki, S. Kato, Y. Zhu, J. Kawakami, M. Hasegawa, T. Honda, M. Niibe

Proceedings Volume 6921, 69212U (2008) https://doi.org/10.1117/12.772624

KEYWORDS: Wavefronts, Diffusion tensor imaging, Optical testing, Extreme ultraviolet, Projection systems, Mirrors, EUV optics, Wavefront metrology, Interferometers, Optics manufacturing

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Proceedings Article | 21 March 2008 Paper

Paper

Phenomenological analysis of carbon deposition rate on the multilayer mirror

Shintaro Kawata, Katsuhiko Murakami, Takashi Sudo, Takashi Aoki, Shigeru Terashima, Masahito Niibe, Yutaka Watanabe, Hiromitsu Takase, Shuichi Matsunari, Yasuaki Fukuda, Yukinobu Kakutani, Takahiro Nakayama

Proceedings Volume 6921, 69213B (2008) https://doi.org/10.1117/12.769958

KEYWORDS: Carbon, Extreme ultraviolet, Mirrors, Protactinium, Extreme ultraviolet lithography, Multilayers, Bioalcohols, Chemical species, Coating, Oxidation

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Proceedings Article | 20 March 2008 Paper

Paper

Development status of projection optics and illumination optics for EUV1

Hiroyuki Kondo, Katsuhiko Murakami, Kazushi Nomura, Hiromitsu Iwata, Hiroshi Chiba, Tetsuya Oshino, Hideki Komatsuda

Proceedings Volume 6921, 69210Q (2008) https://doi.org/10.1117/12.772435

KEYWORDS: Projection systems, Mirrors, Wavefronts, Polishing, Extreme ultraviolet, Point spread functions, Multilayers, Optical coatings, Extreme ultraviolet lithography, Reflection

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Proceedings Article | 21 March 2007 Paper

Paper

Carbon deposition on multi-layer mirrors by extreme ultra violet ray irradiation

K. Murakami, M. Tanabe, S. Terashima, T. Aoki, S. Matsunari, Y. Gomei, M. Niibe, H. Takase, Y. Kakutani, Y. Watanabe, Y. Fukuda

Proceedings Volume 6517, 65172X (2007) https://doi.org/10.1117/12.710816

KEYWORDS: Carbon, Extreme ultraviolet, Mirrors, Gases, Natural surfaces, Reflectivity, Adsorption, Protactinium, Lithography, Extreme ultraviolet lithography

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Proceedings Article | 15 March 2007 Paper

Paper

Development of optics for EUV lithography tools

Kazushi Nomura, Tetsuya Oshino, Hideki Komatsuda, Hiroshi Chiba, Katsuhiko Murakami, Hiroyuki Kondo, Hiromitsu Iwata

Proceedings Volume 6517, 65170J (2007) https://doi.org/10.1117/12.711738

KEYWORDS: Mirrors, Projection systems, Coating, Polishing, Eye, Wavefronts, Extreme ultraviolet lithography, Multilayers, Aspheric optics, Wavefront metrology

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Proceedings Article | 13 March 2007 Paper

Paper

Nikon EUVL development progress update

Yoshiaki Kohama, Kenji Morita, Kazuaki Suzuki, Kazunari Hada, Yukiharu Ohkubo, Katsuhiko Murakami, Takaharu Miura

Proceedings Volume 6517, 651707 (2007) https://doi.org/10.1117/12.711267

KEYWORDS: Extreme ultraviolet lithography, Projection systems, Reticles, Light sources, Reflectivity, Extreme ultraviolet, Photomasks, EUV optics, Wavefront sensors, Semiconducting wafers

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Extreme Ultra Violet Lithography (EUVL) has been widely regarded as the lithography technology to succeed optical lithography. It is now considered as one of the most promising technologies below hp45nm node [1], following ArF immersion lithography considering trend of achievable process K1 factors shown in Fig. 1. In this paper we would like to present significant progress on the development of EUV exposure tool. There are several key important areas which should be developed to realize EUVL to be feasible such as reflective mask, resist, and tool itself. The reflective mask features such characteristics as pellicle-less, ultra-smooth blank flatness and defect free. The resist should be of high sensitivity and small line edge roughness (LER) as well as fine resolution. EUV exposure tool itself consists of major modules such as EUV light source, projection optics, vacuum body, vacuum stages, and so on. As far as EUVL optics development is concerned, through the development of high-NA small-field EUV exposure system (HiNA) in conjunction with EUVA (Extreme Ultraviolet Lithography System Development Association) projects, we have developed new polishing technologies such as ion-beam figuring and elastic emission machining, and new ultra high-precision interferometers for aspheric surface metrology. Wave front sensor system has been also developed partly in EUVA project. A new wave front sensor system which can be used for evaluating the projection optics with EUV light has already been installed in New SUBARU synchrotron facility in University of Hyogo. Our multi-layer coating technology has been also improved. High reflective Mo/Si multi layer coating has been successfully achieved and irradiation tests using synchrotron radiation have been conducted [8]. Successful achievement of those developments enables us to produce full-field projection optics for EUVL process development tool called EUV1. Proto-type development of full-field projection optics has been successfully completed and evaluated to be of enough performance. Preparation of complete set of production and metrology tools necessary for projection optics production was completed and all tools are now in full operation. Nikon has studied reticle protection method and developed Dual Pod Concept in cooperation with Canon. Nikon also has developed its own reticle cover to be implemented in EUV1 tool. Nikon has completed almost all module fabrication such as full-field projection optics module, illumination optics module, vacuum body module, vacuum compatible reticle/wafer stage modules, reticle/wafer loader modules, and EUV light source module. Nikon has already got into module integration production process to meet EUV1 development schedule. Nikon announced to start EUV1 tool installation in 1st half of 2007 and has been proceeding it on schedule. Nikon also would like to announce that development of 1st generation production EUVL tool dubbed EUV2 is now considered and that system concept design is under way.

Proceedings Article | 24 March 2006 Paper

Paper

New contamination experimental equipment in the NewSUBARU and evaluation of Si-capped multilayer mirrors using it

Shuichi Matsunari, Katsuhiko Murakami, Hiromitsu Takase, Yukinobu Kakutani, Takashi Aoki, Masahito Niibe, Yoshio Gomei, Yasuaki Fukuda, Shigeru Terashima

Proceedings Volume 6151, 615134 (2006) https://doi.org/10.1117/12.656845

KEYWORDS: Extreme ultraviolet, Mirrors, Reflectivity, Contamination, Extreme ultraviolet lithography, Absorption, Carbon, Protactinium, Oxygen, In situ metrology

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Proceedings Article | 24 March 2006 Paper

Paper

Study of ruthenium-capped multilayer mirror for EUV irradiation durability

Takashi Aoki, Yukinobu Kakutani, Katsuhiko Murakami, Masayuki Tanabe, Shigeru Terashima, Yutaka Watanabe, Shuichi Matsunari, Hiromitsu Takase, Yoshio Gomei, Masahito Niibe

Proceedings Volume 6151, 615135 (2006) https://doi.org/10.1117/12.657089

KEYWORDS: Silicon, Extreme ultraviolet, Ruthenium, Diffusion, Reflectivity, Protactinium, Extreme ultraviolet lithography, Oxides, Mirrors, Oxidation

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Proceedings Article | 24 March 2006 Paper

Paper

EUV wavefront metrology at EUVA

Hideo Yokota, Chidane Ouchi, Masahito Niibe, Takayuki Hasegawa, Masashi Okada, Mitsuo Takeda, Katsumi Sugisaki, Seima Kato, Jun Saito, Masanobu Hasegawa, Katsuhiko Murakami

Proceedings Volume 6152, 61522O (2006) https://doi.org/10.1117/12.656039

KEYWORDS: Wavefronts, Optical testing, Extreme ultraviolet, Diffraction, EUV optics, Projection systems, Extreme ultraviolet lithography, Diffraction gratings, CCD cameras, Mirrors

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Proceedings Article | 23 March 2006 Paper

Paper

Effect of residual gas atmosphere on lifetime of Ru-capped EUVL projection optics mirror

Hiromitsu Takase, Yukinobu Kakutani, Yoshio Gomei, Katsuhiko Murakami, Shuichi Matsunari, Masahito Niibe, Takashi Aoki, Yasuaki Fukuda, Shigeru Terashima

Proceedings Volume 6151, 61510H (2006) https://doi.org/10.1117/12.656240

KEYWORDS: Reflectivity, Extreme ultraviolet, Mirrors, Protactinium, Extreme ultraviolet lithography, Projection systems, Atmospheric optics, Carbon, Lithography, Oxidation

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Proceedings Article | 10 March 2006 Paper

Paper

Nikon EUVL development progress summary

Kazuaki Suzuki, Takeshi Asami, Yukiharu Ohkubo, Yoshiaki Kohama, Takaharu Miura, Katsuhiko Murakami

Proceedings Volume 6151, 615105 (2006) https://doi.org/10.1117/12.656243

KEYWORDS: Extreme ultraviolet lithography, Reticles, Mirrors, Projection systems, Coating, Reflectivity, Polishing, Particles, EUV optics, Surface finishing

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Extreme Ultra Violet Lithography (EUVL) is considered as the most promising technology below hp45nm node, following ArF immersion lithography. In this paper we would like to present significant progress on the development of EUV exposure tool with recent encouraging data of mirror polishing accuracy and evaluation results of Nikon reticle protection concept. EUV exposure tool consists of major important modules such as EUV light source, projection optics, and so on. As far as EUVL optics development is concerned, through the development of high-NA small-field EUV exposure system (HiNA), our mirror polishing and metrology technologies of aspheric mirror surface and multi-layer coating technology have been remarkably improved and enable us to fabricate high-precision aspheric mirrors which meet the specification for EUV pre-production tools called EUV1. In the EUVA (Extreme Ultraviolet Lithography System Development Association) project, we have developed new polishing technologies such as ion-beam figuring and new high-precision interferometers for aspheric surface metrology. Wave front sensor systems have been also developed partly in EUVA project. Installation of a new wave front sensor system which can be used for evaluating the full-field projection optics with EUV light has already been started in New SUBARU synchrotron facility in University of Hyogo. EUV1 tool system design and its detailed design of all modules such as full-field projection optics module, illumination optics module, vacuum body module, vacuum compatible reticle/wafer stage modules, reticle/wafer loader modules have been completed. The results of development and prototyping of major modules such as vacuum stage modules and vacuum body module have been reflected in the actual tool design. Nikon has been also heavily involved in the infrastructure development such as mask handling development. In order to meet industry demands, Nikon has been already getting into EUV1 module fabrication phase. Nikon announces that EUV1 tool is scheduled to be delivered in 1^st half of 2007.

Proceedings Article | 17 September 2005 Paper

Paper

Comparisons between EUV at-wavelength metrological methods

Mikihiko Ishii, Masashi Okada, Akiyoshi Suzuki, Katsuhiko Murakami, Jun Saito, Katsumi Sugisaki, Chidane Ouchi, Yucong Zhu, Katsura Otaki, Masahito Niibe, Takayuki Hasegawa, Mitsuo Takeda, Masanobu Hasegawa, Jun Kawakami, Seima Kato, Hideo Yokota, Zhiqiang Liu

Proceedings Volume 5921, 59210D (2005) https://doi.org/10.1117/12.616676

KEYWORDS: Wavefronts, Optical testing, Extreme ultraviolet, Metrology, Diffusion tensor imaging, Charge-coupled devices, EUV optics, Interferometers, Shearing interferometers, Diffraction

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Proceedings Article | 10 May 2005 Paper

Paper

Double-grating lateral shearing interferometer for EUV optics at-wavelength measurement

Masanobu Hasegawa, Yucong Zhu, Akiyoshi Suzuki, Masashi Okada, Jun Saito, Chidane Ouchi, Zhiqiang Liu, Katsumi Sugisaki, Katsuhiko Murakami, Masahito Niibe, Katsura Ohtaki, Seima Kato, Mikihiko Ishii

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599456

KEYWORDS: Diffraction, Diffraction gratings, Calibration, Shearing interferometers, Wavefronts, Light sources, Interferometers, Monochromatic aberrations, Extreme ultraviolet lithography, EUV optics

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Proceedings Article | 10 May 2005 Paper

Paper

Experimental comparison of absolute PDI and lateral shearing interferometer

Masahito Niibe, Takayuki Hasegawa, Mikihiko Ishii, Akiyoshi Suzuki, Chidane Ouchi, Masanobu Hasegawa, Katsura Otaki, Zhiqian Liu, Seima Kato, Yucong Zhu, Masashi Okada, Jun Kawakami, Katsuhiko Murakami, Katsumi Sugisaki, Jun Saito

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600274

KEYWORDS: Wavefronts, Shearing interferometers, Diffraction gratings, Extreme ultraviolet lithography, Extreme ultraviolet, Charge-coupled devices, Diffraction, Interferometers, Photomasks, Monochromatic aberrations

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Proceedings Article | 6 May 2005 Paper

Paper

Comparison of EUV interferometry methods in EUVA project

Jun Saito, Katsuhiko Murakami, Takayuki Hasegawa, Masashi Okada, Masanobu Hasegawa, Akiyoshi Suzuki, Mitsuo Takeda, Seima Kato, Katsumi Sugisaki, Yucong Zhu, Chidane Ouchi, Masahito Niibe

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600468

KEYWORDS: Wavefronts, Optical testing, Diffraction, Charge-coupled devices, Extreme ultraviolet, Monochromatic aberrations, Interferometers, Phase shifts, Calibration, Diffraction gratings

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Proceedings Article | 6 May 2005 Paper

Paper

Lithographic performance of high-numerical-aperture (NA=0.3) EUV small-field exposure tool (HINA)

I. Nishiyama, Y. Tanaka, F. Kumasaka, K. Sugisaki, K. Murakami, M. Shiraishi, H. Oizumi, H. Kondo, T. Oshino

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599435

KEYWORDS: Extreme ultraviolet lithography, Lithography, Photomasks, Projection systems, Mirrors, Lithographic illumination, Light sources, Printing, Extreme ultraviolet, Spherical lenses

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Proceedings Article | 18 October 2004 Paper

Paper

Fabrication of aspherical mirrors for EUV projection optics set-3 of HiNA

Noriaki Kandaka, Katsuhiko Murakami, Tetsuya Oshino, Takahiro Yamamoto, Iwao Nishiyama, Shin-ichi Takahashi, Tatsuro Miyoshi, Shinji Okazaki, Hiroaki Oizumi, Hiroyuki Kondo, Masayuki Shiraishi, Takaharu Komiya, Kiyoto Mashima, Kazushi Nomura

Proceedings Volume 5533, (2004) https://doi.org/10.1117/12.559210

KEYWORDS: Mirrors, Wavefronts, Projection systems, Polishing, Semiconducting wafers, Extreme ultraviolet lithography, Spatial frequencies, Photomasks, Coating, Mirror mounts

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Proceedings Article | 18 October 2004 Paper

Paper

Recent progress of EUV wavefront metrology in EUVA

Katsura Otaki, Akiyoshi Suzuki, Seima Kato, Jun Saito, Akinori Ohkubo, Katsuhiko Murakami, Takayuki Hasegawa, Mitsuo Takeda, Katsumi Sugisaki, Masashi Okada, Masahito Niibe, Chidane Ouchi, Masanobu Hasegawa

Proceedings Volume 5533, (2004) https://doi.org/10.1117/12.562431

KEYWORDS: Wavefronts, Extreme ultraviolet, Optical testing, Diffraction, Wavefront metrology, Interferometers, Shearing interferometers, Diffusion tensor imaging, Spherical lenses, Diffraction gratings

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Proceedings Article | 20 May 2004 Paper

Paper

Low-stress and high-reflectivity molybdenum/silicon multilayers deposited by low-pressure rotary magnet cathode sputtering for EUV lithography

Katsuhiko Murakami, Masayuki Shiraishi, Noriaki Kandaka

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536075

KEYWORDS: Multilayers, Reflectivity, Sputter deposition, Molybdenum, Extreme ultraviolet, Silicon, Extreme ultraviolet lithography, Surface roughness, Xenon, Microcrystalline materials

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Proceedings Article | 20 May 2004 Paper

Paper

Fabrication of aspherical mirrors for HiNA (high numerical aperture EUV exposure tool) set-3 projection optics

Masayuki Shiraishi, Kiyoto Mashima, Tetsuya Oshino, Shinji Okazaki, Tatsuro Miyoshi, Hiroaki Oizumi, Kazushi Nomura, Isa Nishiyama, Katsuhiko Murakami, Noriaki Kandaka, Hiroyuki Kondo, Takaharu Komiya, Takahiro Yamamoto

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.562365

KEYWORDS: Mirrors, Wavefronts, Projection systems, Spatial frequencies, Semiconducting wafers, Polishing, Extreme ultraviolet lithography, Photomasks, Mirror mounts, Reflectivity

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Proceedings Article | 20 May 2004 Paper

Paper

Evaluation of contamination deposition on pinholes used in EUV at-wavelength PDI

Seima Kato, Masanobu Hasegawa, Chidane Ouchi, Katsumi Sugisaki, Akiyoshi Suzuki, Katsuhiko Murakami, Masahito Niibe, Jun Saito

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537344

KEYWORDS: Oxygen, Contamination, Tantalum, Extreme ultraviolet, Nickel, Gold, Carbon, Adsorption, Projection systems, Wavefronts

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Proceedings Article | 20 May 2004 Paper

Paper

Lateral shearing interferometer for EUVL: theoretical analysis and experiment

Masanobu Hasegawa, Chidane Ouchi, Masahito Niibe, Katsumi Sugisaki, Akiyoshi Suzuki, Yucong Zhu, Katsuhiko Murakami

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537331

KEYWORDS: Wavefronts, Charge-coupled devices, Extreme ultraviolet lithography, Shearing interferometers, Phase shifts, Diffraction gratings, Projection systems, Algorithm development, Diffraction, Extreme ultraviolet

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Proceedings Article | 20 May 2004 Paper

Paper

EUV wavefront metrology system in EUVA

Takayuki Hasegawa, Katsuhiko Murakami, Masahito Niibe, Akiyoshi Suzuki, Masanobu Hasegawa, Katsumi Sugisaki, Seima Kato, Chidane Ouchi, Jun Saito

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536327

KEYWORDS: Extreme ultraviolet, Wavefronts, Monochromatic aberrations, Wavefront metrology, Photomasks, Metrology, Nickel, Synchrotron technology, Interferometers, Spherical lenses

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Proceedings Article | 13 January 2004 Paper

Paper

Development of Mo/Si multilayers deposited by low-pressure rotary magnet cathode sputtering for EUV lithography

Katsuhiko Murakami, Masayuki Shiraishi

Proceedings Volume 5193, (2004) https://doi.org/10.1117/12.508116

KEYWORDS: Multilayers, Reflectivity, Sputter deposition, Molybdenum, Silicon, Extreme ultraviolet, Xenon, Interfaces, Extreme ultraviolet lithography, Argon

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Proceedings Article | 13 January 2004 Paper

Paper

Rigorous wavefront analysis of the visible-light point diffraction interferometer for EUVL

Shigeru Nakayama, Katsuhiko Murakami, Mikihiko Ishii, Yucong Zhu, Katsura Otaki, Takashi Gemma

Proceedings Volume 5193, (2004) https://doi.org/10.1117/12.507046

KEYWORDS: Wavefronts, Mirrors, Point diffraction interferometers, Extreme ultraviolet lithography, Diffraction, Error analysis, Projection systems, Numerical simulations, Wavefront analysis, Computer simulations

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Proceedings Article | 16 June 2003 Paper

Paper

Development of illumination optics and projection optics for high-NA EUV exposure tool (HiNA)

Shinji Okazaki, Katsumi Sugisaki, Katsuhiko Murakami, Kazuya Ota, Hiroyuki Kondo, Noriaki Kandaka, Iwao Nishiyama, Hiroaki Oizumi, K. Mashima, Tetsuya Oshino, Masayuki Shiraishi

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484936

KEYWORDS: Mirrors, Projection systems, Wavefronts, Extreme ultraviolet lithography, Spherical lenses, Metals, Mirror mounts, Optical components, Lithographic illumination, Photography

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Proceedings Article | 16 June 2003 Paper

Paper

Mo/Si multilayers deposited by low-pressure rotary magnet cathode sputtering for extreme-ultraviolet lithography

Katsuhiko Murakami, Noriaki Kandaka, Masayuki Shiraishi

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484436

KEYWORDS: Multilayers, Reflectivity, Sputter deposition, Molybdenum, Extreme ultraviolet, Xenon, Silicon, Argon, Extreme ultraviolet lithography, Ions

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Proceedings Article | 16 June 2003 Paper

Paper

Development of an experimental EUV interferometer for benchmarking several EUV wavefront metrology schemes

Akiyoshi Suzuki, Mikihiko Ishii, Osamu Kakuchi, Jun Kawakami, Yutaka Watanabe, Seiji Takeuchi, Yucong Zhu, Chidane Ouchi, Jun Saito, Shinichi Hara, Katsumi Sugisaki, Tetsuya Oshino, Hiroyuki Kondo, Takayuki Hasegawa, Katsuhiko Murakami, Kazuya Ota, Yoshiyuki Sekine, Masanobu Hasegawa

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484935

KEYWORDS: Extreme ultraviolet, Wavefront metrology, Wavefronts, Optical testing, Interferometers, Shearing interferometers, Diffraction, Mirrors, Extreme ultraviolet lithography, Diffraction gratings

Read Abstract +

Proceedings Article | 1 July 2002 Paper

Paper

Effect of argon and non-argon ion impingement on the stress reduction of multilayers for extreme-ultraviolet lithography

Tetsuya Oshino, Noriaki Kandaka, Masayuki Shiraishi, Katsuhiko Murakami, Wakana Ishiyama

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472329

KEYWORDS: Molybdenum, Silicon, Argon, Chemical species, Sputter deposition, Ions, Oxides, Ion beams, Oxygen, Extreme ultraviolet lithography

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Proceedings Article | 20 December 2001 Paper

Paper

Stress control of Mo/Si-based multilayer coatings deposited by ion-beam sputtering

Masayuki Shiraishi, Katsuhiko Murakami

Proceedings Volume 4506, (2001) https://doi.org/10.1117/12.450945

KEYWORDS: Molybdenum, Multilayers, Silicon, Ion beams, Sputter deposition, Polishing, Ions, Reflectivity, Ruthenium, Interfaces

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Proceedings Article | 20 August 2001 Paper

Paper

Development of an EUV reflectometer using a single line emission from a laser-plasma x-ray source

Noriaki Kandaka, Masayuki Shiraishi, Katsumi Sugisaki, Wakana Ishiyama, Tetsuya Oshino, Katsuhiko Murakami, Hiroyuki Kondo

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436714

KEYWORDS: Extreme ultraviolet, Mirrors, Reflectivity, Carbon dioxide lasers, Reflectometry, Multilayers, Carbon dioxide, Interfaces, Plasma, Beryllium

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Proceedings Article | 20 August 2001 Paper

Paper

Feasibility study of EUV scanners

Tetsuya Oshino, Katsumi Sugisaki, Kazuya Ota, Hideki Komatsuda, Katsuhiko Murakami, Hiroyuki Kondo

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436704

KEYWORDS: Semiconducting wafers, Scanners, Mirrors, Reticles, Extreme ultraviolet lithography, Optical alignment, Sensors, Projection systems, Deep ultraviolet, Extreme ultraviolet

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Proceedings Article | 20 August 2001 Paper

Paper

In-situ stress measurement of molybdenum/silicon multilayers and low-stress multilayers for extreme-ultraviolet lithography

Tetsuya Oshino, Katsuhiko Murakami, Noriaki Kandaka, Wakana Ishiyama, Masayuki Shiraishi

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436713

KEYWORDS: Molybdenum, Silicon, Capacitance, Capacitors, Multilayers, Electrodes, Sputter deposition, Extreme ultraviolet lithography, Ion beams, Semiconducting wafers

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Proceedings Article | 2 November 2000 Paper

Paper

Development of an EUV reflectometer using a laser plasma x-ray source

Wakana Ishiyama, Katsuhiko Murakami, Tetsuya Oshino, Noriaki Kandaka, Katsumi Sugisaki, Hiroyuki Kondo, Masayuki Shiraishi

Proceedings Volume 4144, (2000) https://doi.org/10.1117/12.405906

KEYWORDS: Reflectometry, Mirrors, Reflectivity, X-rays, X-ray sources, Plasma, Carbon dioxide, Multilayers, Extreme ultraviolet, Carbon dioxide lasers

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Proceedings Article | 21 July 2000 Paper

Paper

Assembly and alignment of three-aspherical-mirror optics for extreme ultraviolet projection lithography

Shigeru Shirayone, Shigeo Irie, Katsuhiko Murakami, Takeo Watanabe, Hiroo Kinoshita, Tetsuya Oshino, Katsumi Sugisaki, Atsushi Miyafuji

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390114

KEYWORDS: Mirrors, Optical alignment, Extreme ultraviolet, Projection systems, Extreme ultraviolet lithography, Wavefronts, Tolerancing, Assembly tolerances, Monochromatic aberrations, Multilayers

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Proceedings Article | 21 July 2000 Paper

Paper

Development for the alignment procedure of three-aspherical mirror optics

Takeo Watanabe, Atsushi Miyafuji, Hiroo Kinoshita, Tetsuya Oshino, Shigeo Irie, Katsumi Sugisaki, Katsuhiko Murakami

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390122

KEYWORDS: Mirrors, Alignment procedures, NOx, Tolerancing, Extreme ultraviolet lithography, Optical alignment, Interferometers, Ray tracing, Monochromatic aberrations, Geometrical optics

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Proceedings Article | 21 July 2000 Paper

Paper

Recent advances of three-aspherical-mirror system for EUVL

Tetsuya Oshino, Katsuhiko Murakami, Shigeo Irie, Shigeru Shirayone, Yanqiu Li, Hiroo Kinoshita, Atsushi Miyafuji, Katsumi Sugisaki, Takeo Watanabe, Shinji Okazaki

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390091

KEYWORDS: Mirrors, Extreme ultraviolet lithography, Interferometers, Multilayers, Optical alignment, Phase shifts, Reflectivity, Wavefronts, Coating, Imaging systems

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Proceedings Article | 21 July 2000 Paper

Paper

Stress reduction of molybdenum/silicon multilayers deposited by ion-beam sputtering

Katsuhiko Murakami, Wakana Ishiyama, Masayuki Shiraishi, Tetsuya Oshino

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390102

KEYWORDS: Multilayers, Ion beams, Polishing, Interfaces, Sputter deposition, Reflectivity, Mirrors, Molybdenum, Argon, Extreme ultraviolet lithography

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Proceedings Article | 5 June 1998 Paper

Paper

Three-aspherical-mirror system for EUV lithography

H. Oizumi, Katsuhiko Murakami, Takeo Watanabe, Masahito Niibe, Hiromasa Yamanashi, Hiroo Kinoshita, Masaaki Ito, Nicola Grupido, Yuriy Platonov, Tetsuya Oshino

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309580

KEYWORDS: Semiconducting wafers, Wafer-level optics, Photomasks, Optical alignment, Mirrors, Extreme ultraviolet lithography, Synchrotron radiation, Tolerancing, Assembly tolerances, Optical design

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Proceedings Article | 11 July 1997 Paper

Paper

Development of multilayer mirrors for the XUV Doppler telescope

Tetsuya Oshino, Wakana Ishiyama, Tsuyoshi Yoshida, Shin'ichi Nagata, Hirohisa Hara, Saku Tsuneta, Taro Sakao, Toshifumi Shimizu, Katsuhiko Murakami

Proceedings Volume 3113, (1997) https://doi.org/10.1117/12.278847

KEYWORDS: Mirrors, Reflectivity, Multilayers, Extreme ultraviolet, Doppler effect, Photomasks, Telescopes, Plasma, Silicon, Space telescopes

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Proceedings Article | 25 November 1996 Paper

Paper

Japanese sounding rocket experiment with the solar XUV Doppler telescope

Hirohisa Hara, Katsuhiko Murakami, Taro Sakao, Koji Taguchi, Tsuyoshi Yoshida, Takeo Kosugi, Ryouhei Kano, Katsuhiro Miura, Toshifumi Shimizu, Shin'ichi Nagata, Saku Tsuneta, Masao Inoue, Kazuo Tanimoto, Wakuna Wasa

Proceedings Volume 2804, (1996) https://doi.org/10.1117/12.259721

KEYWORDS: Mirrors, Telescopes, Space telescopes, Extreme ultraviolet, Rockets, Charge-coupled devices, Multilayers, Doppler effect, Solar processes, Coronagraphy

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Proceedings Article | 21 January 1993 Paper

Paper

Characterization of molybdenum/silicon multilayers deposited by ion beam sputtering and rf magnetron sputtering

Hiroshi Nakamura, Hiroshi Nagata, Tetsuya Oshino, Katsuhiko Murakami, Masayuki Ohtani

Proceedings Volume 1742, (1993) https://doi.org/10.1117/12.140572

KEYWORDS: Silicon, Reflectivity, Molybdenum, Sputter deposition, X-rays, Ion beams, Interfaces, Transmission electron microscopy, Chemical species, Analytical research

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Showing 5 of 54 publications

Conference Committee Involvement (3)

Extreme Ultraviolet (EUV) Lithography IV

25 February 2013 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography III

13 February 2012 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography II

28 February 2011 | San Jose, California, United States

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