Mr. Katsuhiko Wakana Profile

Katsuhiko Wakana

at Gigaphoton Inc

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Author

Publications (7)

Proceedings Article | 10 April 2024 Poster

Enhancing wafer productivity through increased repetition rate to 6.75khz with gt80a as ArF immersion light source

Natsuhiko Kouno, Katsuhiko Wakana, Takeshi Ohta, Takashi Saitou

Proceedings Volume PC12953, PC129530T (2024) https://doi.org/10.1117/12.3009787

KEYWORDS: Light sources, Semiconducting wafers, Vacuum chambers, Laser stabilization, Design and modelling, Acoustic waves, Power supplies, Power consumption, Optical components, Dose control

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Proceedings Article | 10 April 2024 Poster

Maximizing availability by enhancing operational efficiency and implementing sophisticated maintenance strategies in complex ArFi light source

Shinichi Matsumoto, Satoshi Tanaka, Toshihiro Oga, Takamitsu Komaki, Katsuhiko Wakana, Takeshi Ohta, Takashi Saitou

Proceedings Volume PC12953, PC129530U (2024) https://doi.org/10.1117/12.3009846

KEYWORDS: Telecommunications, Standards development, Machine learning, Light sources, Data analysis, Speckle, Semiconductor manufacturing, Optics manufacturing, Instrument modeling, Immersion lithography

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Proceedings Article | 10 April 2024 Presentation

Improved ArFi scanner throughput and process yield through a next generation DUV light source featuring high-repetition rate and enhanced speckle contrast

Toshihiro Oga, Takamitsu Komaki, Takeshi Ohta, Shinichi Matsumoto, Katsuhiko Wakana, Kouji Kakizaki, Takashi Saitou

Proceedings Volume PC12953, PC129530C (2024) https://doi.org/10.1117/12.3009784

KEYWORDS: Scanners, Speckle, Deep ultraviolet, Yield improvement, Optical components, Semiconductors, Semiconducting wafers, Pulsed laser operation, Lithography, Line edge roughness

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Proceedings Article | 14 April 2023 Poster

Contributing to sustainability delivers maximizing availability by the latest light source for the ArF immersion lithography and KrF lithography

Takeda Yuuki, Takamitsu Komaki, Hirotaka Miyamoto, Tsukasa Hori, Katsuhiko Wakana, Takeshi Ohta, Takashi Saito, Hakaru Mizoguchi

Proceedings Volume PC12494, PC124940J (2023) https://doi.org/10.1117/12.2658263

KEYWORDS: Light sources, Immersion lithography, Semiconductors, Optical components, Manufacturing, Electrodes

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Proceedings Article | 22 February 2021 Presentation

Latest ArF light source with speckle reduction technology for immersion lithography improving chip yield

Hirotaka Miyamoto, Takamitsu Komaki, Toshihiro Oga, Taku Yamazaki, Tsukasa Hori, Masato Moriya, Hiroshi Tanaka, Takuya Ishii, Akihiko Kurosu, Katsuhiko Wakana, Takeshi Ohta, Satoru Bushida, Takashi Saito, Hakaru Mizoguchi

Proceedings Volume 11613, 116130D (2021) https://doi.org/10.1117/12.2583281

KEYWORDS: Light sources, Speckle, Yield improvement, Extreme ultraviolet lithography, Immersion lithography, Spatial coherence, Temporal coherence, Line width roughness, Optical lithography, Lithography

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Proceedings Article | 3 October 2018 Paper

Key components development progress of high-power LPP-EUV light source with unique debris mitigation system using a magnetic field

Yuichi Nishimura, Tsukasa Hori, Takayuki Yabu, Katsuhiko Wakana, Yoshifumi Ueno, Georg Soumagne, Shinji Nagai, Tatsuya Yanagida, Yasufumi Kawasuji, Yutaka Shiraishi, Tamotsu Abe, Hiroaki Nakarai, Takashi Saito, Hakaru Mizoguchi

Proceedings Volume 10809, 108091M (2018) https://doi.org/10.1117/12.2500356

KEYWORDS: Extreme ultraviolet, Tin, Gas lasers, Magnetism, Light sources, Mirrors, Plasma, Picosecond phenomena, Semiconductors

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Proceedings Article | 16 March 2009 Paper

Optical performance of laser light source for ArF immersion double patterning lithography tool

Katsuhiko Wakana, Hiroaki Tsushima, Shinichi Matsumoto, Masaya Yoshino, Takahito Kumazaki, Hidenori Watanabe, Takeshi Ohta, Satoshi Tanaka, Toru Suzuki, Hiroaki Nakarai, Yasufumi Kawasuji, Akihiko Kurosu, Takashi Matsunaga, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 7274, 72743J (2009) https://doi.org/10.1117/12.813476

KEYWORDS: Lithography, Light sources, Double patterning technology, Laser optics, Line edge roughness, Spatial coherence, Speckle, Temporal coherence, Immersion lithography, Critical dimension metrology

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Showing 5 of 7 publications

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