Katsuhiro Yamashita
at FUJIFILM Corp
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Electrodes, Polymers, Ionization, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Yield improvement, Absorption, Chemically amplified resists

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Polymers, Glasses, Diffusion, Image resolution, Electroluminescence, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers

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